常压放电低温等离子体辐射特性测量实验
[1] ROTH J R.Industrial Plasma Engineering -Volume 2:Applications To Nonthermal Plasma Processing[M].Bristol and Philadelphia,London:Institute of Physics Publishing,2001.
[2] 管井秀郎.等离子体电子工程学[M].张海波,张丹.北京:科学出版社,2002.SUGAI Hideo.Plasma Electronic Engineering[M].ZHANG Hai-bo,ZHANG Dan.Beijing:Science Press,2002.
[3] 任兆杏,丁振峰.低温等离子体技术[J].自然杂志,1996,18(4):201-207.REN Zhao-xing,DING Zhen-feng.Low Temperature Plasma Technology[J].Journal of Ziran,1996,18(4):201-207.
[4] 李成榕,王新新.大气压下的辉光放电[J].高电压技术,2002,28(12):41-43.LI Cheng-rong,WANG Xin-xin.Atmospheric Pressure Glow Discharge (APGD)[J].High Voltage Engineering,2002,28(12):41-43.
[5] 张锐,刘鹏,詹如娟.大气压辉光放电研究现状及应用前景[J].物理,2004,33(6):430-434.ZHANG Rui,LIU Peng,ZHAN Ru-juan.Status and Application Prospects of Atmospheric Pressure Glow Discharge Studies[J].Physics,2004,33(6):430-434.
[6] 林麒,任庆磊.常压空气辉光放电等离子体光辐射特性试验[J].厦门大学学报(自然科学版),2005,44(5):621-624.LIN Qi,REN Qing-lei.Investigation in Radiation characteristic of Atmospheric Pressure Glow Discharge Plasma in Air[J].Journal of Xiamen University (Natural Science),2005,44(5):621-624.
林麒, 任庆磊. 常压放电低温等离子体辐射特性测量实验[J]. 光电工程, 2007, 34(1): 41. 林麒, 任庆磊. Radiation characteristic measurement of low temperature plasma under atmospheric pressure[J]. Opto-Electronic Engineering, 2007, 34(1): 41.
PDF全文
