介质阻挡放电中单双层气隙内微放电通道的等离子体参量研究
[1] Kogelschatz U. J. Phys. Conf. Ser., 2010, 257: 012015.
[2] Catlla A J, McNamara A, Topaz C M. Phys. Rev. E, 2012, 85: 026215.
[3] Stauss S, Muneoka H, Ebato N, et al. Plasma Sources Sci. Technol., 2013, 22: 025021.
[4] Hebei University. Chinese Patent(中国专利): 201310321858.3, 2013-10-16.
[5] Hebei University. Chinese Patent(中国专利): 201310555528.0, 2014-02-19.
[6] Hebei University. Chinese Patent(中国专利): 201310031529.5, 2013-04-24.
[7] Gao Yenan, Pan Yuyang, Dong Lifang, et al. Phys. Plasmas, 2014, 21: 103515.
[8] Liu Weibo, Dong Lifang, Wang Yongjie, et al. Phys. Plasmas, 2014, 21: 113504.
[9] Liu Ying, Dong Lifang, Niu Xuejiao, et al. Phys. Plasmas, 2015, 22: 103501.
[10] Tang Jie, Jiang Weiman, Zhao Wei, et al. Appl. Phys. Lett., 2013, 102: 033503.
[12] Dong Lifang, Shang Jie, Song Qian, et al. IEEE Trans on Plasma Sci., 2012, 40(4): 1162.
高星, 董丽芳, 王浩, 张浩. 介质阻挡放电中单双层气隙内微放电通道的等离子体参量研究[J]. 光谱学与光谱分析, 2017, 37(9): 2692. GAO Xing, DONG Li-fang, WANG Hao, ZHANG Hao. Study on the Plasma Parameters of Single and Double Gas Layer Gap in Dielectric Barrier Discharge[J]. Spectroscopy and Spectral Analysis, 2017, 37(9): 2692.