Chinese Optics Letters, 2013, 11 (5): 053002, Published Online: Apr. 16, 2013
Repetition rate dependence of absorption of fused silica irradiated at 193 nm
Basic Information
DOI: | 10.3788/col201311.053002 |
中图分类号: | -- |
栏目: | Spectroscopy |
项目基金: | -- |
收稿日期: | Dec. 27, 2012 |
修改稿日期: | -- |
网络出版日期: | Apr. 16, 2013 |
通讯作者: | |
备注: | -- |
Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002.