Chinese Optics Letters, 2013, 11 (5): 053002, Published Online: Apr. 16, 2013
Repetition rate dependence of absorption of fused silica irradiated at 193 nm
Suppl. Mat.
Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002.
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