Repetition rate dependence of absorption of fused silica irradiated at 193 nm

Weijing Liu; Bincheng Li

doi:doi:10.3788/col201311.053002

Chinese Optics Letters, 2013, 11 (5): 053002, Published Online: Apr. 16, 2013

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

论文大纲

Weijing Liu Bincheng Li

Author Affiliations

300.1030 Absorption 160.4670 Optical materials 140.2180 Excimer lasers

Abstract

Repetition rate-dependent absorbance measurements of synthetic fused silica at 193-nm irradiation are performed in the range of 50–1 000 Hz with an ArF laser calorimeter. The "apparent" single- and twophoton absorption coefficients are determined by measuring the laser fluence-dependent absorbance of fused silica samples with different thicknesses to separate the surface absorption and bulk absorption. The measurement results indicate a reversible nonlinear increase of both apparent single- and two-photon absorption coefficients with increasing repetition rate for the synthetic fused silica, whereas the surface absorption shows no dependence on the repetition rate.

References

[1] R. Kitamura, L. Pilon, and M. Jonasz, Appl. Opt. 46, 8118 (2007).

[2] Ch. Muhlig, W. Triebel, and S. Kufert, J. Non-Cryst. Solids 357, 1981 (2011).

[3] Ch. Muhlig, S. Bublitz, and W. Paa, Proc. SPIE 8082, 808225 (2011).

[4] D. Schonfeld, U. Klett, Ch. Muhlig, and S. Thomas, Proc. SPIE 6720, 67201A (2007).

[5] Ch. Muhlig and W. Triebel, J. Non-Cryst. Solids 355, 1080 (2009).

[6] I. Balasa, H. Blaschke, L. Jensen, and D. Ristau, Proc. SPIE 8190, 81901T (2011).

[7] J. Moll and P. M. Schermerhorn, Proc. SPIE 3679, 1129 (1999).

[8] J. Moll, Proc. SPIE 4346, 1272 (2001).

[9] Ch. Muhlig, H. Stafast, and W. Triebel, J. Non-Cryst. Solids 354, 25 (2008).

[10] K. Mann, A. Bayer, U. Leinhos, T. Miege, and B. Schafer, Proc. SPIE 6924, 69242P (2008).

[11] K. Mann, U. Leinhos, J. Sudradjat, and B. Schafer, Proc. SPIE 8190, 81901S (2011).

[12] ISO 11551, "Optics and optical instruments-Lasers and laser-related equipment-Test method for absorptance of optical laser components" (2000).

[13] H. Blaschke, M. Jup'e, and D. Ristau, Proc. SPIE 4932, 467 (2003).

[14] U. Natura, R. Martin, G. Goenna, M. Kahlke, and G. Fasold, Proc. SPIE 5754, 1312 (2005).

[15] L. Skuja, H. Hosono, M. Hirano, and K. Kajihara, Proc. SPIE 5122, 1 (2003).

[16] Y. Ikuta, S. Kikugawa, M. Hirano, and H. Hosono, Proc. SPIE 4347, 187 (2001).

[17] Q. Lou, H. Zhang, Z. Yuan, and J. Zhou, Proc. SPIE 8206, 820607 (2012).

[18] Ch. Muhlig, W. Triebel, and S. Kufert, J. Non-Cryst. Solids 353, 542 (2007).

Weijing Liu, Bincheng Li. Repetition rate dependence of absorption of fused silica irradiated at 193 nm[J]. Chinese Optics Letters, 2013, 11(5): 053002.

Repetition rate dependence of absorption of fused silica irradiated at 193 nm

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