深紫外、极紫外光刻、先进光源等现代光学工程牵引驱动超精密光学技术持续发展, 超精密光学制造要求与之精度相匹配的超高精度检测技术。作为核心技术指标之一的面形精度通常要求达到纳米、深亚纳米甚至几十皮米量级, 超高精度面形干涉检测技术挑战技术极限, 具有重要研究意义和应用价值。本文分析了面形干涉检测技术发展趋势, 主要介绍了中国科学院光电技术研究所近年来在超高精度面形干涉检测技术相关研究进展。

This review focuses on recent developments in additive manufacturing (AM) of precision optical devices, particularly devices consisting of components with critical features at the micro- and nanoscale. These include, but are not limited to, microlenses, diffractive optical elements, and photonic devices. However, optical devices with large-size lenses and mirrors are not specifically included as this technology has not demonstrated feasibilities in that category. The review is roughly divided into two slightly separated topics, the first on meso- and microoptics and the second on optics with nanoscale features. Although AM of precision optics is still in its infancy with many unanswered questions, the references cited on this exciting topic demonstrate an enabling technology with almost unlimited possibilities. There are many high quality reviews of AM processes of non-optical components, hence they are not the focus of this review. The main purpose of this review is to start a conversion on optical fabrication based on information about 3D AM methods that has been made available to date, with an ultimate long-term goal of establishing new optical manufacturing methods that are low cost and highly precise with extreme flexibility.

深紫外波段是目前常规光学技术的短波极限, 随着波长的缩短, 深紫外光学薄膜开发面临一系列特殊的问题; 而对于深紫外光刻系统这样的典型超精密光学系统来说, 对薄膜光学元件提出的要求则更加苛刻。本文主要介绍了适用于深紫外光刻系统的薄膜材料及膜系设计; 对薄膜沉积工艺、元件面形保障、大口径曲面均匀性等超精密光学元件的指标保障关键问题进行了讨论; 对环境污染与激光辐照特性等光刻系统中薄膜元件环境适应性的重要因素进行了深入分析。以上分析为突破高性能深紫外光刻光学薄膜开发瓶颈, 更好地满足深紫外光刻等极高精度光学系统的应用需求指明了方向。

针对大功率激光检测技术发展中精密光学调整架存在的刚度不足的问题，设计了一种适合装调大口径光学镜片的精密光学调整架结构，并建立其力学模型，分析其动力学性能，通过420 mm大口径球关节调整架结构俯仰模态理论的分析和实验测试数据之间对比，找出导致调整架结构谐振频率变差的原因。采用优化设计后的大口径调整架第一阶俯仰模态的频率为157.788 Hz，能够很好满足在强振源下的工作需要。