1 吉林建筑大学 寒地建筑综合节能教育部重点实验室,吉林 长春 130118
2 吉林建筑大学 电气与计算机学院,吉林 长春 130118
为了提高薄膜晶体管的性能,本文基于射频磁控溅射技术,采用氧化锌锡(ZTO)材料作为沟道层,在SiO2/p-Si衬底上制备高性能ZTO薄膜晶体管。采用AFM、XRD、UV-Vis研究了溅射功率对ZTO薄膜的表面形貌和光学性能的影响。使用半导体参数仪对ZTO薄膜晶体管进行电学性能的测试,利用XPS分析研究溅射功率对ZTO薄膜中元素组成和价态的影响,探索高性能薄膜晶体管的原理机制。实验结果表明,所有ZTO薄膜样品是非晶结构,表面致密,透光率均大于90%。适当增加溅射功率能够改善ZTO薄膜晶体管的电学性能。在90 W溅射功率下制备的薄膜晶体管综合性能较好,其饱和迁移率达到了15.61 cm2/(V·s),亚阈值摆幅为0.30 V/decade,阈值电压为-5.06 V,电流开关比为8.92×109。
薄膜晶体管 溅射功率 XPS分析 ZTO薄膜 thin-film transistor sputtering power XPS analysis ZTO thin film
光学 精密工程
2023, 31(22): 3357
Author Affiliations
Abstract
1 College of Electronic and Information Engineering, Shenzhen University, Shenzhen 518060, China
2 Institute of Microscale Optoelectronics (IMO), Shenzhen University, Shenzhen 518060, China
3 State Key Laboratory of Advanced Displays and Optoelectronics Technologies, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, China
Indium-tin-zinc oxide (ITZO) thin-film transistor (TFT) technology holds promise for achieving high mobility and offers significant opportunities for commercialization. This paper provides a review of progress made in improving the mobility of ITZO TFTs. This paper begins by describing the development and current status of metal-oxide TFTs, and then goes on to explain the advantages of selecting ITZO as the TFT channel layer. The evaluation criteria for TFTs are subsequently introduced, and the reasons and significance of enhancing mobility are clarified. This paper then explores the development of high-mobility ITZO TFTs from five perspectives: active layer optimization, gate dielectric optimization, electrode optimization, interface optimization, and device structure optimization. Finally, a summary and outlook of the research field are presented.
thin-film transistor (TFT) indium-tin-zinc oxide (ITZO) TFT mobility active matrix (AM) displays Journal of Semiconductors
2023, 44(9): 091602
Author Affiliations
Abstract
State Key Laboratory of Advanced Displays and Optoelectronics and Technologies, Department of Electronic and Computer Engineering, The Hong Kong University of Science and Technology, Hong Kong, China
Here we review two 300 °C metal–oxide (MO) thin-film transistor (TFT) technologies for the implementation of flexible electronic circuits and systems. Fluorination-enhanced TFTs for suppressing the variation and shift of turn-on voltage (VON), and dual-gate TFTs for acquiring sensor signals and modulating VON have been deployed to improve the robustness and performance of the systems in which they are deployed. Digital circuit building blocks based on fluorinated TFTs have been designed, fabricated, and characterized, which demonstrate the utility of the proposed low-temperature TFT technologies for implementing flexible electronic systems. The construction and characterization of an analog front-end system for the acquisition of bio-potential signals and an active-matrix sensor array for the acquisition of tactile images have been reported recently.
flexible electronics metal–oxide semiconductor thin-film transistor dual gate fluorination analog front-end system sensors Journal of Semiconductors
2023, 44(9): 091601
1 北京理工大学 光电学院,北京市混合现实与先进显示技术工程研究中心,北京 100081
2 重庆京东方显示技术有限公司,重庆 400714
3 北京京东方显示技术有限公司,北京 101520
随着显示技术的不断发展,对高性能、高稳定性的薄膜晶体管(Thin Film Transistor,TFT)的需求日趋增加,通过结晶改善薄膜晶体管性能的方法受到大量关注。当前,铟镓锌氧化物(IGZO)材料由于具有迁移率高、柔性好、透明度高等优势,被广泛用于薄膜晶体管的沟道中,而改善IGZO沟道层的结晶形态也成为研究热点。本文总结了晶态IGZO薄膜晶体管器件的研究进展,详细介绍了IGZO系化合物的晶体结构,重点阐述了单晶、c轴取向结晶、六方多晶型、尖晶石型、纳米晶型和原生结晶型IGZO的结构和各晶态IGZO薄膜晶体管的制备方法、器件性能和稳定性,深入分析其微观结构,总结物理特性,阐述不同晶系结构的结晶机理,建立不同晶体结构与电学特性的关系,最后对晶态IGZO薄膜晶体管的发展进行展望。
晶态IGZO薄膜 薄膜晶体管 晶体结构 研究进展 crystalline IGZO film thin film transistor crystal structure research progress
1 北京工业大学材料与制造学部,北京 100124
2 平板显示玻璃工艺技术国家工程研究中心,咸阳 712000
结合我国薄膜晶体管液晶显示(TFT-LCD)产业发展,按照时间顺序和产业参与主体回顾了我国LCD基板玻璃产业发展历史。在国家政策支持和企业努力下,整个LCD基板玻璃产业经历三十余年的探索与磨砺,终于在“十三五”期间突破了基板玻璃G8.5系列的技术壁垒,实现了高世代、大尺寸LCD面板用基板玻璃国产化配套。LCD基板玻璃产业做大做强还需政产学研用多方共同努力补链和强链,才能尽早实现我国LCD基板玻璃产业的自主可控。
薄膜晶体管液晶显示 基板玻璃 产业发展 自主可控 thin-film transistor liquid crystal display substrate glass development history independence and controllability
本文介绍了聚乙烯醇(PVA)衬底薄膜晶体管(TFT)的器件制备、电学性能分析和器件溶解特性的演示。该器件以高介电材料氧化铪(HfO2)作为绝缘层,铝掺杂氧化锌(AZO)作为有源层,铝作为栅极、源级与漏极。采用低温磁控溅射(PVD)法成功在PVA衬底上制备出高介电常数(高k )绝缘层的薄膜晶体管,并基于该器件的绝缘层结构做了进一步优化:利用氧化铪(HfO2)氧化铝(Al2O3)的叠层结构作为绝缘层。结果表明相比于单层氧化铪绝缘层结构的TFT,叠层结构绝缘层的TFT器件性能更优,具有更低的漏电流、更高的开关比和较低的亚阈值摆幅,更适合作为聚乙烯醇衬底薄膜晶体管的绝缘层。“三明治”叠层结构绝缘层的器件开/关比达到2.5×106,阈值电压为10.6 V,亚阈值摆幅为0.53 V·dec-1,载流子迁移率为3.01 cm2·V-1·s-1。