介绍了一种多光束无掩模光刻系统, 该系统利用空间光调制器数字微反射镜(DMD)对405nm的激光光束进行调制, 控制波带片阵列及纳米透镜阵列聚焦, 利用聚焦点阵配合纳米移动平台进行扫描光刻。介绍了该无掩模光刻实验系统结构及工作原理, 并给出了多光束光刻的实验结果。实验表明: 利用普通蓝紫光源和聚焦元件阵列可实现分辨率为400nm的多光束并行光刻。

A multi-beam lithograph system is introduced. The system uses a digital micro-mirror device (DMD) as a spatial light modulator to modulate the 405nm laser. By controlling the zone-plate-array or focusing-element-array to focus on the substrate to form a focusing-lattice, scanning lithograph is achieved with a nanometer moving platform. The setup and principle of the system is introduced and the result of the experiments is given. The experiment proved that multi-beam lithography with resolution of 400nm is achieved using the ordinary blue light and focusing-element-array.