强激光与粒子束, 2011, 23 (3): 806, 网络出版: 2011-04-01
激光干涉光刻法制作100 nm掩模
Fabrication of 100 nm mask by laser interference lithography
引用该论文
陈欣, 赵青, 方亮, 王长涛, 罗先刚. 激光干涉光刻法制作100 nm掩模[J]. 强激光与粒子束, 2011, 23(3): 806.
Chen Xin, Zhao Qing, Fang Liang, Wang Changtao, Luo Xiangang. Fabrication of 100 nm mask by laser interference lithography[J]. High Power Laser and Particle Beams, 2011, 23(3): 806.
陈欣, 赵青, 方亮, 王长涛, 罗先刚. 激光干涉光刻法制作100 nm掩模[J]. 强激光与粒子束, 2011, 23(3): 806. Chen Xin, Zhao Qing, Fang Liang, Wang Changtao, Luo Xiangang. Fabrication of 100 nm mask by laser interference lithography[J]. High Power Laser and Particle Beams, 2011, 23(3): 806.
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