利用电子束蒸发在硅基底材料上沉积氟化镱(YbF3)薄膜,并对不同沉积温度所得薄膜进行了研究。研究结果表明,在反可见透红外波段上,沉积温度对于YbF3薄膜的物理和光学特性有较大影响。当沉积温度为150 ℃和180 ℃时,硅基底上的YbF3薄膜的光学性能和可靠性较差;当沉积温度为220 ℃和240 ℃时,硅基底上的YbF3薄膜具有良好的光学性能和可靠性,能适用于不同要求的薄膜产品研制。

In the material deposited on the silicon substrate and thin film,ytterbium fluoride was studied on different deposition temperature in the films by electron beam evaporation and silicon as substrate.The results show that in the opposite visible through infrared,YbF3 film deposition temperature has great impact on the physical and optical properties.At 150 ℃ and 180 ℃,optical properties and reliability of YbF3 films on silicon substrate are not good.When the temperature is 220 ℃ and 240 ℃,YbF3 thin films have good optical and reliability performance,which are suitable to the different requirements for the development of film products.