用于光刻调焦调平的反射式投影光学系统设计 下载: 1356次
孙生生, 王丹, 齐月静, 宗明成. 用于光刻调焦调平的反射式投影光学系统设计[J]. 光学学报, 2020, 40(15): 1522002.
Shengsheng Sun, Dan Wang, Yuejing Qi, Mingcheng Zong. Design of Reflective Projection Optics Used in Lithographic Focusing and Leveling System[J]. Acta Optica Sinica, 2020, 40(15): 1522002.
[1] Fontaine B M L, Hauschild J, Dusa M V, et al. Study of the influence of substrate topography on the focusing performance of advanced lithography scanners[J]. Proceedings of SPIE, 2003, 5040: 570-581.
[2] Boeij W P D, Pieternella R, Bouchoms I, et al. Extending immersion lithography down to 1x nm production nodes[J]. Proceedings of SPIE, 2013, 8683: 86831L.
[3] Kerr PB, FuchsJ, Crouch R T . internet based method and system for worldwidepromoting and offering for sale or license patent rights and patent application rights:US20180158160[P]. 2018-06-07.
[4] HidakaY, Ishikawa M . Surface position detecting apparatus, exposureapparatus, surface position detectingmethod, device manufacturing method:US8223345[P]. 2012-07-17.
[5] KobayashiT, Kosugi Y. Surface position measuring method and apparatus:US7668343[P]. 2010-02-23.
[6] 李小平, 陈飞彪. 投影光刻机硅片调焦调平测量模型[J]. 光学学报, 2007, 27(11): 1987-1991.
[7] . Optical focus and level sensor for wafer steppers[J]. Journal of Vacuum Science & Technology B, 1992, 10(2): 735-740.
[8] Jasper J CM, Loopstra ER, Modderman TM, et al. 2004-04-29.
[9] Yan W, Yang Y, Chen W F, et al. Moiré-based focusing and leveling scheme for optical projection lithography[J]. Applied Optics, 2010, 49(31): 5959-5963.
[10] 孙裕文, 李世光, 宗明成. 基于空间分光的纳米级调焦调平测量技术[J]. 光学学报, 2016, 36(5): 0512002.
[11] 庄亚政, 齐景超, 陈小娟. 基于扫描反射镜调制的调焦调平系统测试方法研究[J]. 传感器与微系统, 2017, 36(10): 45-47.
Zhuang Y Z, Qi J C, Chen X J. Research on test method of focusing and leveling system based on scanning mirror modulation[J]. Transducer and Microsystem Technologies, 2017, 36(10): 45-47.
[12] 朱雨霁, 尹达一, 陈永和, 等. 高光谱分辨率紫外Offner成像光谱仪系统设计[J]. 光学学报, 2018, 38(2): 0222001.
[13] 黄元申, 倪争技. 同心三反射镜光学系统研究[J]. 光学仪器, 2005, 27(2): 42-46.
Huang Y S, Ni Z J. Research of the concentric three-reflection optical system[J]. Optical Instruments, 2005, 27(2): 42-46.
[14] Jang J H, Park T, Park K D, et al. Focus control budget analysis for critical layers of flash devices[J]. Proceedings of SPIE, 2014, 9050: 90502F.
孙生生, 王丹, 齐月静, 宗明成. 用于光刻调焦调平的反射式投影光学系统设计[J]. 光学学报, 2020, 40(15): 1522002. Shengsheng Sun, Dan Wang, Yuejing Qi, Mingcheng Zong. Design of Reflective Projection Optics Used in Lithographic Focusing and Leveling System[J]. Acta Optica Sinica, 2020, 40(15): 1522002.