激光与光电子学进展, 2019, 56 (3): 031601, 网络出版: 2019-07-31
强辐照下光子晶体红外隐身薄膜的隐身特性 下载: 1178次
Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film under Intense Irradiation
图 & 表
图 1. 不同入射角下光子晶体的反射率曲线
Fig. 1. Spectral reflectance curves of photonic crystal at different incident angles
图 5. 三种隐身材料的实际红外反射率曲线
Fig. 5. Measured infrared reflectance curves of three stealth materials
图 8. 四个方向实时测量的三种材料中红外有效辐射温度曲线。(a)探测器位于东面和西面;(b)探测器位于南面和北面
Fig. 8. Middle-infrared radiation temperature curves of three stealth materials measured in real time from four directions. (a) Detector is located in east or west; (b) detector is located in south or north
刘瑞煌, 时家明, 赵大鹏, 张继魁, 刘志伟. 强辐照下光子晶体红外隐身薄膜的隐身特性[J]. 激光与光电子学进展, 2019, 56(3): 031601. Ruihuang Liu, Jiaming Shi, Dapeng Zhao, Jikui Zhang, Zhiwei Liu. Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film under Intense Irradiation[J]. Laser & Optoelectronics Progress, 2019, 56(3): 031601.