液晶与显示, 2016, 31 (5): 460, 网络出版: 2016-06-06  

不同双栅极设计对a-Si∶H TFT 特性影响

Effect of different dual gate design on A-Si∶H TFT electrical characteristics
作者单位
合肥鑫晟光电科技有限公司,安徽 合肥 230012
引用该论文

林致远, 马骏, 林亮, 杨成绍, 邹志翔, 黄寅虎, 文锺源, 王章涛. 不同双栅极设计对a-Si∶H TFT 特性影响[J]. 液晶与显示, 2016, 31(5): 460.

LIN Zhi-yuan, MA Jun, LIN Liang, YANG Cheng-shao, ZOU Zhi-xiang, HUANG Yin-hu, WEN Zhong-yuan, WANG Zhang-tao. Effect of different dual gate design on A-Si∶H TFT electrical characteristics[J]. Chinese Journal of Liquid Crystals and Displays, 2016, 31(5): 460.

参考文献

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[2] VAN BERKEL C, POWELL M J. The photosensitivity of amorphous silicon thin film transistors \[J\]. Journal of Non-Crystalline Solids, 1985, 77-78(12): 1393-1396.

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[4] SERVATI P, NATHAN A. Modeling of the reverse characteristics of a-Si: H TFTs \[J\]. IEEE Transactions on Electron Devices, 2002, 49(5): 812-819.

[5] SERVATI P, KARIM K S, NATHAN A. Static characteristics of a-Si: H dual-gate TFTs \[J\]. IEEE Transactions on Electron Devices, 2003, 50(4): 926-932.

[6] LIANG C Y, GAN F Y, YEH F S, et al. Letter: Mechanisms for on/off currents in dual-gate a-Si: H thin-film transistors using indium-tin-oxide top-gate electrodes \[J\]. Journal of the Society for Information Display, 2007, 15(11): 975-978.

[7] LIU Y, YAO R H, LI B,et al. A physical model based on surface potential for double-gate a-Si: H TFTs \[C\]. Proceedings of IEEE International Conference of Electron Devices and Solid-State Circuits, Xi’an, P.R. China: IEEE, 2009: 75-78.

[8] SPIJKMAN M J, MYNY K, SMITS EC P, et al. Dual-gate thin-film transistors, integrated circuits and sensors \[J\]. Advanced Materials, 2011, 23(29): 3231-3242.

[9] 商广良,赵天月,赵星星,等.低功耗TFT-LCD驱动方法\[J\].液晶与显示,2012,27(6): 785-788.

    SHANG G L, ZHAO T Y, ZHAO X X, et al. Driving method for low power consumption in TFT-LCDs \[J\]. Chinese Journal of Liquid Crystals and Displays, 2012, 27(6): 785-788. (in Chinese)

[10] LI X L, GENG D, MATIVENGA M, et al. Effect of bulk-accumulation on switching speed of dual-gate a-IGZO TFT-based circuits \[J\]. IEEE Electron Device Letters, 2014, 35(12): 1242-1244.

林致远, 马骏, 林亮, 杨成绍, 邹志翔, 黄寅虎, 文锺源, 王章涛. 不同双栅极设计对a-Si∶H TFT 特性影响[J]. 液晶与显示, 2016, 31(5): 460. LIN Zhi-yuan, MA Jun, LIN Liang, YANG Cheng-shao, ZOU Zhi-xiang, HUANG Yin-hu, WEN Zhong-yuan, WANG Zhang-tao. Effect of different dual gate design on A-Si∶H TFT electrical characteristics[J]. Chinese Journal of Liquid Crystals and Displays, 2016, 31(5): 460.

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