W/SiO<sub>2</sub>基太阳光谱选择性吸收薄膜的制备和表征

郭帅; 吴莹; 古同; 胡二涛

doi:doi:10.3788/AOS201939.0531001

光学学报, 2019, 39 (5): 0531001, 网络出版: 2019-05-10

W/SiO₂基太阳光谱选择性吸收薄膜的制备和表征下载： 1164次

Preparation and Characterization of Solar-Selective Absorbers Based on Multilayered W/SiO₂ Thin Films

郭帅吴莹古同胡二涛 ^*

作者单位

南京邮电大学电子与光学工程学院、微电子学院, 江苏南京 210023

图 & 表

图 1. W/SiO26层薄膜样品的结构示意图

Fig. 1. Structural diagram of W/SiO2 six-layer film sample

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图 2. 制备态样品的TEM截面图

Fig. 2. Cross-sectional TEM image of sample in preparation state

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图 3. 样品的理论反射光谱和测量得到的反射光谱

Fig. 3. Measured and theoretical reflectance spectra of sample

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图 4. 样品实物图和热成像图。(a)放置于加热台上的样品实物图;(b)加热台温度设置为120 ℃时样品的热成像图;(c)加热台温度设置为200 ℃时样品的热成像图

Fig. 4. Physical map and infrared thermal image of sample. (a) Physical map of sample mounted on heating stage; (b) infrared thermal image of sample when heating temperature is set as 120 ℃; (c) infrared thermal image of sample when heating temperature is set as 200 ℃

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图 5. 样品在退火前后的反射光谱

Fig. 5. Measured reflectance spectra of annealed and unannealed samples

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郭帅, 吴莹, 古同, 胡二涛. W/SiO₂基太阳光谱选择性吸收薄膜的制备和表征[J]. 光学学报, 2019, 39(5): 0531001. Shuai Guo, Ying Wu, Tong Gu, Ertao Hu. Preparation and Characterization of Solar-Selective Absorbers Based on Multilayered W/SiO₂ Thin Films[J]. Acta Optica Sinica, 2019, 39(5): 0531001.

W/SiO₂基太阳光谱选择性吸收薄膜的制备和表征下载： 1164次

图 1. W/SiO26层薄膜样品的结构示意图

Fig. 1. Structural diagram of W/SiO2 six-layer film sample

图 2. 制备态样品的TEM截面图

Fig. 2. Cross-sectional TEM image of sample in preparation state

图 3. 样品的理论反射光谱和测量得到的反射光谱

Fig. 3. Measured and theoretical reflectance spectra of sample

图 4. 样品实物图和热成像图。(a)放置于加热台上的样品实物图;(b)加热台温度设置为120 ℃时样品的热成像图;(c)加热台温度设置为200 ℃时样品的热成像图

Fig. 4. Physical map and infrared thermal image of sample. (a) Physical map of sample mounted on heating stage; (b) infrared thermal image of sample when heating temperature is set as 120 ℃; (c) infrared thermal image of sample when heating temperature is set as 200 ℃

图 5. 样品在退火前后的反射光谱

Fig. 5. Measured reflectance spectra of annealed and unannealed samples

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W/SiO2基太阳光谱选择性吸收薄膜的制备和表征 下载： 1164次

图 1. W/SiO26层薄膜样品的结构示意图

Fig. 1. Structural diagram of W/SiO2 six-layer film sample

图 2. 制备态样品的TEM截面图

Fig. 2. Cross-sectional TEM image of sample in preparation state

图 3. 样品的理论反射光谱和测量得到的反射光谱

Fig. 3. Measured and theoretical reflectance spectra of sample

图 4. 样品实物图和热成像图。(a)放置于加热台上的样品实物图;(b)加热台温度设置为120 ℃时样品的热成像图;(c)加热台温度设置为200 ℃时样品的热成像图

Fig. 4. Physical map and infrared thermal image of sample. (a) Physical map of sample mounted on heating stage; (b) infrared thermal image of sample when heating temperature is set as 120 ℃; (c) infrared thermal image of sample when heating temperature is set as 200 ℃

图 5. 样品在退火前后的反射光谱

Fig. 5. Measured reflectance spectra of annealed and unannealed samples

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W/SiO₂基太阳光谱选择性吸收薄膜的制备和表征下载： 1164次