光学学报, 2016, 36 (10): 1012002, 网络出版: 2016-10-12   

基于Ptychography的极紫外光刻投影物镜波像差检测技术

Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography
方伟 1,2,*唐锋 1王向朝 1,2朱鹏辉 1,2李杰 1,2孟泽江 1,2张恒 1,2
作者单位
1 中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
2 中国科学院大学, 北京 100049
引用该论文

方伟, 唐锋, 王向朝, 朱鹏辉, 李杰, 孟泽江, 张恒. 基于Ptychography的极紫外光刻投影物镜波像差检测技术[J]. 光学学报, 2016, 36(10): 1012002.

Fang Wei, Tang Feng, Wang Xiangzhao, Zhu Penghui, Li Jie, Meng Zejiang, Zhang Heng. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. Acta Optica Sinica, 2016, 36(10): 1012002.

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方伟, 唐锋, 王向朝, 朱鹏辉, 李杰, 孟泽江, 张恒. 基于Ptychography的极紫外光刻投影物镜波像差检测技术[J]. 光学学报, 2016, 36(10): 1012002. Fang Wei, Tang Feng, Wang Xiangzhao, Zhu Penghui, Li Jie, Meng Zejiang, Zhang Heng. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. Acta Optica Sinica, 2016, 36(10): 1012002.

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