镀制方式对高衰减镍铬合金膜中性度的影响

王忠连; 王瑞生; 阴晓俊; 张勇喜; 金秀; 马敬

doi:doi:10.3969/j.issn.1003-501x.2014.08.015

光电工程, 2014, 41 (8): 90, 网络出版: 2014-09-01

镀制方式对高衰减镍铬合金膜中性度的影响

The Influence of Different Coating Process on Density Neutrality of Deep Attenuation Ni-Cr Film

论文大纲

王忠连 ^*王瑞生阴晓俊张勇喜金秀马敬

作者单位

沈阳仪表科学研究院有限公司, 沈阳 110043

中性密度滤光片镀制方式中性度镍铬合金 neutrality density filter (ND filter) coating process density neutrality Ni-Cr alloy

摘要

对比了用不同镀制工艺方式镀制的 Ni80Cr20膜中性密度滤光片的中性度特性, 溅射工艺镀制的密度片中性度值 3.7%, 远好于电子枪蒸发和电阻蒸发镀制结果 (15%)。采用相平衡理论, 模拟计算了的热蒸发镀制的镍铬合金膜的蒸发速率, 铬相比镍含量偏高 2.8倍, 导致了膜层中合金含量相对膜料出现较大差异, 导致中性密度滤光片光谱中性度的下降。使用蔡司 SUPRA35扫描电镜和牛津 EDS能谱仪分别测试了溅射工艺和热蒸发工艺镀制的密度滤光片的镍铬含量, 测试结果与模拟分析结论基本一致。

Abstract

Compare the density neutrality of Neutral Density (ND) filter coated with different coating process when the coating material is Ni80-Cr20. The density neutrality value is 3.7% when the filter coated with magnetron sputtering technical, and the value is better than that of coated with Electronic Beam(EB) evaporation or resistance evaporation process, which valued 15%. Based on phase equilibrium theory, the reason why neutrality was reduced when coating Ni-Cr alloy under EB and resistance coatings were simulated and analyzed. At first of evaporation process, Cr is 2.8 times more than Ni, which causes density neutrality reduced. To certificate the analyzed results, Ni and Cr determination in both magnetron sputtering coating and resistance evaporation process were tested by Zeiss SEM and Oxford EDS. The experimental data is similar to theoretical results.

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王忠连, 王瑞生, 阴晓俊, 张勇喜, 金秀, 马敬. 镀制方式对高衰减镍铬合金膜中性度的影响[J]. 光电工程, 2014, 41(8): 90. WANG Zhonglian, WANG Ruisheng, YIN Xiaojun, ZHANG Yongxi, JIN Xiu, MA Jing. The Influence of Different Coating Process on Density Neutrality of Deep Attenuation Ni-Cr Film[J]. Opto-Electronic Engineering, 2014, 41(8): 90.

镀制方式对高衰减镍铬合金膜中性度的影响

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