[1] Michael R B, James A F, Christopher J S, et al. Improved method for laser damage testing coated optics［C］//Proc of SPIE. 2005: 59912A.

[2] 孙承纬,陆启生,范正修,等.激光辐照效应［M］.北京: 国防工业出版社, 2002: 264-265.(Sun Chengwei, Lu Qisheng, Fan Zhengxiu, et a1. Laser irradiation effect. Beijing: National Defense Industry Press, 2002: 264-265)

[3] Chow R, Falabella S, Loomis G E, et al. Absorption and damage thresholds of lowdefectdensity hafnia deposited with activated oxygen［C］//Proc of SPIE. 1992, 1848: 349-360.

[4] Kozlowski M R, Mouser R, Maricle S, et al. Laser damage performance of fused silica optical components measured on the beamlet laser at 351 nm［C］//Proc of SPIE. 1999, 3578: 436-445.

[5] Norton M A, Donohue E E, Feit M D, et al. Growth of laser damage in SiO2 under multiple wavelength irradiation［C］//Proc of SPIE. 2005: 599108.

[6] 尹伟,徐世珍,祖小涛,等. 355 nm激光作用下熔石英损伤增长［J］.强激光与粒子束,2008, 20(12): 1989-1992.(Yin Wei, Xu Shizhen, Zu Xiaotao, et al. Growth of laser initiated damage in fused silica at 355 nm. High Power Laser and Particle Beams，2008, 20(12): 1989-1992)

[7] 胡建平,张问辉,段利华,等.K9玻璃表面的1064 nm 激光损伤［J］.激光杂志,2006, 27(3): 59-60.(Hu Jianping, Zhang Wenhui, Duan Lihua, et al. laser damage of the K9 surface under 1064 nm. Laser Journal，2006, 27(3): 59-60)

[8] Norton M A, Feit M D. Initiation, growth and mitigation of UV laser induced damage in fused silica［C］//Proc of SPIE. 2002, 4679: 79-95.

[9] Norton M A, Donohue E E, Hollingsworth W G, et al. Growth of laserinitiated damage in fused silica at 1053 nm［C］//Proc of SPIE. 2005, 5647: 197-205.

[10] Norton M A, Donohue E E, Hollingsworth W G, et al. Growth of laserinitiated damage in fused silica at 527 nm［C］//Proc of SPIE. 2004, 5273: 236-243.

[11] Norton M A, Adams J J, Carr C W, et al. Growth of laser damage in fused silica: diameter to depth ratio［C］//Proc of SPIE. 2007: 67200H.

[12] Norton M A, Donohue E E, Feit M D, et al. Growth of laser damage on the input surface of SiO2 at 351 nm［C］//Proc of SPIE. 2007: 64030L.

[13] Genin F Y, Stolz C J. Growth of laserinduced damage during repetitive illumination of HfO2SiO2 multilayer mirror and polarizer coatings［C］//Proc of SPIE. 1997, 2966: 273-282.

[14] 李大伟, 陶春先, 李笑, 等. 1064 nm与532 nm激光对电子束蒸发制备的HfO2/SiO2高反膜损伤比较［J］.强激光与粒子束, 2008, 20(9):1457-1460.(Li Dawei, Tao Chunxian, Li Xiao, et al. Comparison of laser induced damage at 1064 nm and 532 nm to highreflective film fabricated by electron beam evaporation. High Power Laser and Particle Beams, 2008, 20(9): 1457-1460)

[15] Norton M A, Hrubesh L W, Wu Z, et al. Growth of laser initiated damage in fused silica at 351 nm［C］//Proc of SPIE. 2000, 4347: 468-473.