强激光与粒子束, 2013, 25 (9): 2275, 网络出版: 2013-08-28
基频HfO2/SiO2高反射薄膜激光损伤生长特性
Laser damage growth characteristics of HfO2/SiO2 high reflection film at 1064 nm
图 & 表
张艳云, 马彬, 马宏平, 焦宏飞, 程鑫彬. 基频HfO2/SiO2高反射薄膜激光损伤生长特性[J]. 强激光与粒子束, 2013, 25(9): 2275. Zhang Yanyun, Ma Bin, Ma Hongping, Jiao Hongfei, Cheng Xinbin. Laser damage growth characteristics of HfO2/SiO2 high reflection film at 1064 nm[J]. High Power Laser and Particle Beams, 2013, 25(9): 2275.