光电工程, 2009, 36 (5): 52, 网络出版: 2009-10-09
双光谱法实现光刻工艺中的胶厚检测
Two-spectrum Method for Measuring the Thickness of Photoresist in Lithography Techniques
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张春晖, 陈龙江, 梁宜勇, 杨国光. 双光谱法实现光刻工艺中的胶厚检测[J]. 光电工程, 2009, 36(5): 52. ZHANG Chun-hui, CHEN Long-jiang, LIANG Yi-yong, YANG Guo-guang. Two-spectrum Method for Measuring the Thickness of Photoresist in Lithography Techniques[J]. Opto-Electronic Engineering, 2009, 36(5): 52.
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