光电子快报(英文版), 2017, 13 (1): 45, Published Online: Sep. 13, 2018  

Effects of etching conditions on surface morphology of periodic inverted trapezoidal patterned Si(100) substrate

Author Affiliations
State Key Laboratory of Solid State Lighting, Beijing Engineering Research Center for the 3rd Generation Semiconductor Materials and Application, Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
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ZHANG Lu, YUAN Guo-dong, WANG Qi, WANG Ke-chao, WU Ruiwei, LIU Zhi-qiang, LI Jin-min, WANG Jun-xi. Effects of etching conditions on surface morphology of periodic inverted trapezoidal patterned Si(100) substrate[J]. 光电子快报(英文版), 2017, 13(1): 45.

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ZHANG Lu, YUAN Guo-dong, WANG Qi, WANG Ke-chao, WU Ruiwei, LIU Zhi-qiang, LI Jin-min, WANG Jun-xi. Effects of etching conditions on surface morphology of periodic inverted trapezoidal patterned Si(100) substrate[J]. 光电子快报(英文版), 2017, 13(1): 45.

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