[1] 祝绍箕, 邹海兴, 包学诚 等. 衍射光栅［M］.北京：机械工业出版社, 1986. 343～345

    Zhu Saoji, Zou Haixing, Bao Xuecheng et al.. Diffraction Gratings ［M］. Beijing: China Machine Press, 1986. 343～345

[2] 孔鹏, 巴音贺希格, 李文昊 等. 全息光栅非对称曝光显影的理论模拟及实时监测［J］. 光学学报, 2010, 30(1): 65～69

    Kong Peng, Bayanheshig, Li Wenhao et al.. Modeling and in-situ monitoring of the asymmetric exposure and development of holographic grating［J］. Acta Optica Sinica, 2010, 30(1): 65～69

[3] 赵劲松, 李立峰, 吴振华. 全息光栅实时显影监测曲线的理论模拟 ［J］. 光学学报, 2004, 24(8): 1146～1150

    Zhao Jinsong, Li Lifeng, Wu Zhenhua. Modeling of in-situ monitoring curves during development of holographic gratings［J］. Acta Optica Sinica, 2004, 24(8): 1146～1150

[4] E. H. Anderson, V. Bogli, M. L. Schattenburg et al.. Metrology of electron-beam lithography systems using holographically produced reference samples ［J］. J. Vac. Sci. Technol. B, 1991, 9(6): 3606～3611

[5] J. Ferrera, M. L. Schattenburg, H. I. Smith. Analysis of distortion in interferometric lithography ［J］. J. Vac. Sci. Technol. B, 1996, 14(6): 4009～4013

[6] J. Ferrera, V. V. Wong, S. Rishton et al.. Spatial-phase-locked electron-beam lithography: initial test results［J］. J. Vac. Sci. Technol. B, 1993, 11(6): 2342～2345

[7] 徐福全, 金陆, 李文昊. 曝光系统离焦对平面全息光栅衍射波前的影响［J］. 中国光学与应用光学, 2008, 1(1): 57～61

    Xu Fuquan, Jin Lu, Li Wenhao et al.. Influence of defocus of exposure system on diffraction wavefront of plane holographic grating ［J］. Chinese J. Optics and Applied Optics, 2008, 1(1): 57～61

[8] Zhang Wei, Wu Jianhong, Zhu Jianqiang et al.. New method for the fabrication of pulse compression grating［C］. SPIE, 2006, 6149: 614921

[9] 张伟, 吴建宏, 李朝明. 光栅波像差对脉冲压缩的影响［J］. 强激光与离子束, 2005, 17(3): 399～402

    Zhang Wei, Wu Jianhong, Li Chaoming. Effect of wavefront aberration of grating on pulse compression［J］. Hign Power Laser and Partical Beams, 2005, 17(3): 399～402

[10] 张伟, 吴建宏, 朱健强 等. 脉冲压缩光栅光路调节新方法研究 ［J］. 光学学报, 2006, 26(11): 1609～1613

    Zhang Wei, Wu Jianhong, Zhu Jianqiang et al.. New method to regulate light path of pulse compression grating［J］. Acta Optica Sinica, 2006, 26(11): 1609～1613

[11] 李朝明, 吴建宏, 陈欣荣 等. 脉冲压缩光栅光学拼接方法研究［J］. 光学学报, 2009, 29(7): 1943～1946

    Li Chaoming, Wu Jianhong, Chen Xinrong et al.. Research on the muti-exposure method to fabricate pulse compression masaic grating［J］. Acta Optica Sinica, 2009, 29(7): 1943～1946

[12] 王诗华, 吴建宏, 李朝明 等. 用平凸透镜制作大口径光栅的像差分析［J］. 激光杂志, 2007, 28(6): 48～50

    Wang Shihua, Wu Jianhong, Li Chaoming et al.. Wavefront aberration analyse of large aperture grating fabricated by plano-convex lens［J］. Laser Journal, 2007, 28(6): 48～50

[13] C. G. Chen. Beam Alignment and Image Metrology for Scanning Beam Interference Lithography Fabricating Gratings with Nanometer Phase Accuracy [D]. Massachusetts: Massachusetts Institute of Technology, 2003

[14] 巴音贺希格, 邵先秀, 崔继承 等. 制作平面全息光栅的离轴抛物镜/洛艾镜干涉系统［J］. 光学 精密工程, 2011, 19(1): 56～63

    Bayanheshig, Shao Xianxiou, Cui Jicheng et al.. The off-axis parabolic/lioyd′s mirror interferometric system for manufacturing plane holographic gratings ［J］. Optics Precision Engineering, 2011, 19(1): 56～63

[15] 郁道银, 谈恒英. 工程光学［M］. 北京：机械工业出版社，2006. 165～170

    Yu Daoyin, Tan Hengying. Engineering Optics ［M］. Beijing: China Machine Press, 2006. 165～170

[16] C. G. Chen, P. T. Konkola, J. Ferrera et al.. Analyses of vector Gaussian beam propagation and the validity of paraxial and spherical approximations ［J］. Opt. Soc. Am. A, 2002, 19(2): 404～412

[17] P. Konkola, C. G. Chen, R. Heilmann et al.. Beam steering system and spatial filtering applied to interference lithography ［J］. J. Vac. Sci. Technol. B, 2000, 18(6): 3282～3286