光学学报, 2017, 37 (2): 0222002, 网络出版: 2017-02-13
极紫外光刻动态气体锁抑制率的实验研究
Experimental Research on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography
图 & 表
陈进新, 王宇, 谢婉露. 极紫外光刻动态气体锁抑制率的实验研究[J]. 光学学报, 2017, 37(2): 0222002. Chen Jinxin, Wang Yu, Xie Wanlu. Experimental Research on Suppression Ratio of Dynamic Gas Lock for Extreme Ultraviolet Lithography[J]. Acta Optica Sinica, 2017, 37(2): 0222002.