[1] 刘莎, 王丹, 杨照坤, 等．TFT-LCD技术发展趋势浅析[J]．液晶与显示, 2018, 33(6): 457-463．

    LIU S, WANG D, YANG Z K,et al. Key technology trends analysis of TFT-LCD [J]. Chinese Journal of Liquid Crystals and Displays, 2018, 33(6): 457-463. (in Chinese)

[2] 刘丽, 韦建军, 吴卫东, 等．激光诱导化学气相沉积(LCVD)制膜技术[C]//2011中国功能材料科技与产业高层论坛论文集(第三卷)．重庆: 重庆大学, 2011．

    LIU L, WEI J J, WU W D, et al. Technology of thin films by LCVD [C]//Proceedings of 2011 China Functional Materials Technology and Industry Forum (Volume Ⅲ). Chongqing: Chongqing University, 2011. (in Chinese)

[3] 宋登元．光诱导化学汽相淀积(LCVD)技术的研究进展[J]．半导体技术, 1989(2): 1-6．

    SONG D Y. Research progress of laser chemical deposition (LCVD) technology [J].Semiconductor Technology, 1989(2): 1-6. (in Chinese)

[4] 强游．激光化学气相沉积[J]．真空与低温, 1987(1): 44-49．

    QIANG Y. Laser chemical deposition (LCVD) [J].Vacuum and Cryogenics, 1987(1): 44-49. (in Chinese)

[5] JACKSON R L, TYNDALL G W. Kinetics and mechanism of laser-induced photochemical deposition from the group 6 hexacarbonyls [J]. Journal of Applied Physics, 1988, 64(4): 2092-2102.

[6] LUNDQUIST R T, CAIS M. Ultraviolet spectra of organometallic compounds [J].The Journal of Organic Chemistry, 1962, 27(4): 1167-1172.

[7] KAPLAN L H, D’HEURLE F M. The deposition of molybdenum and tungsten films from vapor decomposition of carbonyls [J].Journal of the Electrochemical Society, 1970, 117(5): 693-700.

[8] NAMBU Y, MORISHIGE Y, KISHIDA S. High-speed laser direct writing of tungsten conductors from W(CO)6 [J]. Applied Physics Letters, 1990, 56(25): 2581-2583.

[9] 彭英才, 王英民, 李星文．激光用于半导体工艺的研究进展[J]．稀有金属, 1988, 12(2): 136-145．

    PENG Y C, WANG Y M, LI X W. Research progress of laser used in semiconductor process [J].Chinese Journal of Rare Metals, 1988, 12(2): 136-145. (in Chinese)

[10] JEONG K, LEE J, BYUN I,et al. Synthesis of highly conductive cobalt thin films by LCVD at atmospheric pressure [J]. Materials Science in Semiconductor Processing, 2017, 68: 245-251.

[11] 黄河, 朱晓, 朱长虹, 等．激光化学气相沉积技术在掩模版修复中的应用[J]．激光技术, 2007, 31(3): 330-332．

    HUANG H, ZHU X, ZHU C H,et al. Laser chemical vapor deposition used in photomask repair [J]. Laser Technology, 2007, 31(3): 330-332. (in Chinese)

[12] PARK J B, KIM C J, SHIN P E,et al. Hybrid LCVD of micro-metallic lines for TFT-LCD circuit repair [J]. Applied Surface Science, 2006, 253(2): 1029-1035.

[13] JEONG K, LEE J, BYUN I,et al. Pulsed laser chemical vapor deposition of a mixture of W, WO2, and WO3 from W(CO)6 at atmospheric pressure [J]. Thin Solid Films, 2017, 626: 145-153.