强激光与粒子束, 2016, 28 (6): 064109, 网络出版: 2016-04-12
响应面方法的硅刻蚀工艺优化分析
Optimization of silicon etching process using response surface method
图 & 表
付文婷, 梁峭, 崔可夫, 石天立, 张娜, 郑东明, 唐慧, 孙海玮. 响应面方法的硅刻蚀工艺优化分析[J]. 强激光与粒子束, 2016, 28(6): 064109. Fu Wenting, Liang Qiao, Cui Kefu, Shi Tianli, Zhang Na, Zheng Dongming, Tang Hui, Sun Haiwei. Optimization of silicon etching process using response surface method[J]. High Power Laser and Particle Beams, 2016, 28(6): 064109.