扫描积分塔尔博特光刻条纹质量影响因素模拟分析
[1] 周常河. 微纳光学结构及应用[J]. 激光与光电子学进展, 2009, 46(10): 22-27.
[2] 庄杰, 张大伟, 陶春先, 等. 微纳光学在 LED 芯片中应用研究的综述[J]. 光学技术, 2012, 38(1): 98-103.
[3] 王金光, 李明, 刘剑峰, 等. 微流控芯片在医学检测中的应用[J]. 现代科学仪器, 2007, 17(6): 60-63.
[4] 金永龙, 张宇, 顾宁. 基于准分子激光加工技术的内嵌光纤型微流控器件的制备[J]. 中国激光, 2008, 35(11): 1821-1824.
Jin Yonglong, Zhang Yu, Gu Ning. Fabrication of microchip with embedded optical fibers by excimer laser processing technique[J]. Chinese J Lasers, 2008, 35(11): 1821-1824.
[5] 杨连臣, 李国华, 宋连科, 等. 二元衍射光栅式偏光器件的设计[J]. 光子学报, 1998, 27(9): 833-837.
Yang Lianchen, Li Guohua, Song Lianke, et al. Design of polarizing devices based on the binary-grating diffraction[J]. Acta Photonica Sinica, 1998, 27(9): 833-837.
[6] 孙庆. 基于衍射光栅的高速光纤光栅解调系统的研究[D]. 北京: 北京理工大学, 2015.
Sun Qing. Study on high-speed fiber Bragg grating demodulation system based on diffraction grating[D]. Beijing: Beijing Institute of Technology, 2015.
[7] 谢常青, 朱效立, 牛洁斌, 等. 微纳金属光学结构制备技术及应用[J]. 光学学报, 2011, 31(9): 0900128.
[8] 姚汉民, 胡松, 邢廷文. 光学投影曝光微纳加工技术[M]. 北京: 北京工业大学出版社, 2006.
Yao Hanming, Hu Song, Xing Tingwen. Optical projection exposure technology of micro and nano fabrication[M]. Bejing: Beijing University of Technology Press, 2006.
[9] 张锦. 激光干涉光刻技术[D]. 成都: 四川大学, 2003.
Zhang Jin. Study on laser interferometric lithography[D]. Chengdu: Sichuan University, 2003.
[10] 丁玉成. 纳米压印光刻工艺的研究进展和技术挑战[J]. 青岛理工大学学报, 2010, 31(1): 9-15.
Ding Yucheng. Research progress of nanoimprint lithography and its technical challenges[J]. Journal of Qingdao Technological University, 2010, 31(1): 9-15.
[11] 吕乃光. 傅里叶光学[M]. 北京: 机械工业出版社, 2006: 90-93.
Lü Naiguang. Fourier optics [M]. Beijing: China Machine Press, 2006: 90-93.
[12] 张伟. 光栅塔尔博特效应及其在波前传感中的应用[D]. 济南: 山东师范大学, 2015.
Zhang Wei. Talbot effect of grating and its application in wave-front sensing[D]. Jinan: Shandong Normal University, 2015.
[13] 滕树云, 刘立人, 祖继锋, 等. 脉冲和连续多色光源照明下光栅塔尔博特效应的等价性[J]. 中国激光, 2004, 31(10): 1177-1182.
Teng Shuyun, Liu Liren, Zu Jifeng, et al. Equivalence of Talbot effect of the grating illuminated by the pulsed laser and continuous polychromatic light[J]. Chinese J Lasers, 2004, 31(10): 1177-1182.
[14] 王俊红. 分形光栅及其自成像效应的研究[D]. 济南: 山东师范大学, 2015.
Wang Junhong. Study about fractal grating and its self-image effect[D]. Jinan: Shandong Normal University, 2015.
[15] 张宝昊, 周素梅, 杨晓铭, 等. 方形孔径微透镜阵列的塔尔博特效应[J]. 光学学报, 2016, 36(5): 0523001.
[16] 曲伟娟, 闫爱民, 刘立人, 等. 二维斜周期阵列的分数塔尔博特效应[J]. 中国激光, 2006, 33(3): 356-360.
Qu Weijuan, Yan Aimin, Liu Liren, et al. Fractional Talbot effect of 2D skewed periodic array[J]. Chinese J Lasers, 2006, 33(3): 356-360.
[18] Isoyan A, Jiang F, Cheng Y C, et al. Talbot lithography: self-imaging of complex structures[J]. J Vac Sci Technol B, 2009, 27(6): 2931-2937.
[19] Dunbar L A, Nguyen D, Timotijevic B, et al. Talbot lithography as an alternative for contact lithography for submicron features[C]. SPIE, 2014, 8974: 89740F.
[20] Dammann H, Groh G, Kock M. Restoration of faulty images of periodic objects by means of self-imaging[J]. Applied Optics, 1971, 10(6): 1454-1455.
[21] Stuerzebecher L, Fuchs F, Zeitner U D, et al. High-resolution proximity lithography for nano-optical components[J]. Microelectronic Engineering, 2014, 132: 120-134.
[22] Sato T, Yamada A, Suto T, et al. Printability of defectsin Talbot lithography[J]. Microelectronic Engineering, 2015, 143: 21-24.
[23] Zanke C, Qi M H, Smith H I. Large-area patterning for photonic crystals via coherent diffraction lithography[J]. J Vac Sci Technol B, 2004, 22(6): 3352-3355.
[24] Solak H H, Ekinci Y. Achromatic spatial frequency multiplication: a method for production of nanometer-scale periodic structures[J]. J Vac Sci Technol B, 2005, 23(6): 2705-2710.
[25] Solak H H, Dais C, Clube F. Displacement TalbotLithography: a new method for high-resolution patterning of large areas[J]. Optics Express, 2011, 19(19): 10686-10691.
[26] Solak H H, Dais C, Clube F, et al. Phase shifting masks in Displacement Talbot Lithography for printing nano-grids and periodic motifs[J]. Microelectronic Engineering, 2015, 143: 74-80.
[27] Wang L, Clube F, Dais C, et al. Sub-wavelength printing in the deep ultra-violet region using Displacement Talbot Lithography[J]. Microelectronic Engineering, 2016, 161: 104-108.
邓茜, 赵立新, 唐燕, 姚靖威, 刘俊伯, 胡松. 扫描积分塔尔博特光刻条纹质量影响因素模拟分析[J]. 光学学报, 2016, 36(12): 1205001. Deng Qian, Zhao Lixin, Tang Yan, Yao Jingwei, Liu Junbo, Hu Song. Simulation Analysis on Influencing Factors of Fringe Quality by Displacement Talbot Lithography[J]. Acta Optica Sinica, 2016, 36(12): 1205001.