热丝CVD沉积金刚石薄膜过程中的发射光谱研究
易成, 王传新, 熊江, 范咏志, 汪建华, 马志斌, 满卫东, 王升高. 热丝CVD沉积金刚石薄膜过程中的发射光谱研究[J]. 激光与光电子学进展, 2015, 52(10): 103003.
Yi Cheng, Wang Chuanxin, Xiong Jiang, Fan Yongzhi, Wang Jianhua, Ma Zhibin, Man Weidong, Wang Shenggao. Analysis of Optical Emission Spectroscopy in Diamond of Hot Filament Chemical Vapor Deposition[J]. Laser & Optoelectronics Progress, 2015, 52(10): 103003.
[1] Chen F F. Lecture notes on langmuir probe diagnostics[C]. Moni-Course on Plasma IEEE-ICOPS meeting, Jeju, korea, 2003.
[2] Lunney J G, Doggett B, Kaufmuir Y. Langmuir probe diagnosis of laser ablation plasma[J]. J Phys Conference Series, 2007, 59(1): 470.
[3] 曹金祥, 俞昌旋, 詹如娟, 等. 微波干涉法测量EACVD 中等离子体电子密度[J]. 人工晶体学报, 1993, 8(22): 306-307.
Cao Jinxiang, Yu Changxuan, Zhan Rujuan, et al.. Measurement of plasma electron density in EACVD by microwave interference Method[J]. Journal of Synthetic Crystals, 1993, 8(22): 306-307.
[4] Vandevelde T, Nesladek M, Quaeyhaegens C, et al.. Optical emission spectroscopy of the plasma during microwave CVD of diamond thin films nitrogen addition and relation to the thin film morphology[J]. Thin solid films, 1997, 308: 154-158.
[5] Zhou H Y, Matanabe J, Miyake M, et al.. Optical and mass spectroscopy measurements of Ar/CH4/H2 microwave plasma for nano-crystalline diamond film deposition[J]. Diamond and Related Materials, 2007, 16(1): 675-678.
[6] 李国伟, 曹为, 吴建鹏, 等. MPCVD 等离子体中甲烷体积分数对基团分布的影响[J]. 光学学报, 2013, 33(4): 0430005.
[7] 于碧涌, 段常贵, 竺景芳, 等. LPG 的Antoine 方程常数的确定[J]. 煤气与热力, 2006, 26(4): 18-21.
Yu Biyong, Duan Changgui, Zhu Jingfang, et al.. Determination of antoine equation constants for LPG[J]. Gas and Heat, 2006, 26(4): 18-21.
易成, 王传新, 熊江, 范咏志, 汪建华, 马志斌, 满卫东, 王升高. 热丝CVD沉积金刚石薄膜过程中的发射光谱研究[J]. 激光与光电子学进展, 2015, 52(10): 103003. Yi Cheng, Wang Chuanxin, Xiong Jiang, Fan Yongzhi, Wang Jianhua, Ma Zhibin, Man Weidong, Wang Shenggao. Analysis of Optical Emission Spectroscopy in Diamond of Hot Filament Chemical Vapor Deposition[J]. Laser & Optoelectronics Progress, 2015, 52(10): 103003.