激光与光电子学进展, 2011, 48 (1): 011601, 网络出版: 2010-12-13
GH4033基材相对稀释率的仿真研究
Simulation on Substrate Relative Dilution Ratio for GH4033
图 & 表
陈刚, 黎向锋, 左敦稳, 王宏宇, 张敏. GH4033基材相对稀释率的仿真研究[J]. 激光与光电子学进展, 2011, 48(1): 011601. Chen Gang, Li Xiangfeng, Zuo Dunwen, Wang Hongyu, Zhang Min. Simulation on Substrate Relative Dilution Ratio for GH4033[J]. Laser & Optoelectronics Progress, 2011, 48(1): 011601.