报道用远紫外准分子激光进行亚微米光刻的实验结果。以波长为248.3 nm的KrF准分子激光为光源，以光管均匀器为主构成照明系统，采用带有平行平板为像差校正板的11折反射式投影光刻物镜，在两种光刻胶上分别获得了0.6 μm和0.5 μm的光刻分辨率。

Experimental results of deep submicron lithography with a excimer laser are reported in this paper. With a free running KrF excimer laser, an illumination system including a light pipe uniformizer and a broadband catadioptric 1:1 projection lens with an aberration correcting planoparallel plate, the resolutions of 0.6 μm and 0.5 μm L/S patterns are produced on two resists respectively.