Author Affiliations
Abstract
1 Faculty of Chemistry and Geosciences, Vilnius University, Naugarduko Str. 24, Vilnius LT-03225, Lithuania
2 Femtika, Sauletekio Ave. 15, Vilnius LT-10224, Lithuania
3 Laser Research Center, Physics Faculty, Vilnius University, Sauletekio Ave. 10, Vilnius LT-10223, Lithuania
4 Department of Chemical Engineering and Technology, Center for Physical Sciences and Technology, Sauletekio Ave. 3, Vilnius LT-10257, Lithuania
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The current study is directed to the rapidly developing field of inorganic material 3D object production at nano-/micro scale. The fabrication method includes laser lithography of hybrid organic-inorganic materials with subsequent heat treatment leading to a variety of crystalline phases in 3D structures. In this work, it was examined a series of organometallic polymer precursors with different silicon (Si) and zirconium (Zr) molar ratios, ranging from 9:1 to 5:5, prepared via sol-gel method. All mixtures were examined for perspective to be used in 3D laser manufacturing by fabricating nano- and micro-feature sized structures. Their spatial downscaling and surface morphology were evaluated depending on chemical composition and crystallographic phase. The appearance of a crystalline phase was proven using single-crystal X-ray diffraction analysis, which revealed a lower crystallization temperature for microstructures compared to bulk materials. Fabricated 3D objects retained a complex geometry without any distortion after heat treatment up to 1400 °C. Under the proper conditions, a wide variety of crystalline phases as well as zircon (ZrSiO4 - a highly stable material) can be observed. In addition, the highest new record of achieved resolution below 60 nm has been reached. The proposed preparation protocol can be used to manufacture micro/nano-devices with high precision and resistance to high temperature and aggressive environment.
3D nanostructures additive manufacturing crystalline phases laser lithography 3D printing high resilience inorganic materials SZ2080TM Opto-Electronic Advances
2022, 5(5): 210077
1 中国科学院上海光学精密机械研究所, 上海 201800
2 国家纳米科学中心, 北京 100190
为解决传统光学检测方法存在的对已刻（干刻）区域无法检测、潜在曝光可能性、系统光路复杂以及灵敏度较低等缺点，提出了一种可用于激光直写光刻自动聚焦的高灵敏度流量计式位移检测系统。详细介绍了系统的原理、系统设计、实验方法以及误差分析等。根据流量传感器检测得到的气流变化，可以判断光刻系统中聚焦系统是否离焦以及离焦量的大小。再将此气流变化量转化为电压值反馈至压电陶瓷(PZT)执行机构，通过执行机构实现自动聚焦。由于喷嘴挡板系统可以建立喷嘴挡板间距与喷嘴内部压力的关系，而流量敏感度要高于压力敏感度，故采用了热线探针来检测系统流量变化。实验证明，该方法能够准确检测系统离焦量，系统测量精度可达100 nm，频率响应可达20 Hz，量程可达20 μm。而且在一定范围内喷嘴挡板间距与空气流量变化具有非常好的线性关系。
测量 激光光刻 自动聚焦 气动微距检测 喷嘴挡板 热线探针
中国矿业大学 机电工程学院， 江苏 徐州 221116
搭建了双光束激光干涉光刻系统和激光快速扫描系统。利用干涉光刻系统，实现了不同周期、不同深度、大面积的表面规则光栅织构的构筑。利用激光快速扫描器的二维扫描功能，通过控制激光功率和扫描速度，对曝光量和填充线条间距进行了优化。提出了两种双尺度复合织构的制备方法：一种是在激光快速扫描系统中对抗蚀剂表面分别进行x,y方向的扫描光刻，然后在干涉光刻系统中进行双光束干涉光刻；另一种是在激光干涉光刻系统中进行两次曝光，每次曝光的入射角不同。实验结果表明：这两种方法在制备双尺度复合织构方面具有快速、廉价、操作简易等优点。
双光束干涉 双尺度 表面织构 激光光刻 two-beams interference two-scale texture surface texture laser lithography 强激光与粒子束
2013, 25(11): 2900
1 中国科学院上海技术物理研究所，上海200083
2 西安通信学院基础部，陕西西安710706
在无掩模激光光刻系统中，TI(Texa instrument，德州仪器)公司基于DLP(digital light processing，数字光处理)架构的DMD(digital micromirror device，数字微镜器件)系统已经得到应用，但是存在光刻图像质量和光刻速度无法提高等瓶颈。提出采用单片FPGA控制DMD的架构，使得微镜锁定时间自由可控，在成像质量上高于DLP架构下的光刻成像质量，同时具备的同步功能和高帧频特性可大大提高光刻速度。
激光光刻 空间光调制器 laser lithography DMD DMD FPGA FPGA SLM
中国科学院上海光学精密机械研究所, 上海 201800
报道用远紫外准分子激光进行亚微米光刻的实验结果。以波长为248.3 nm的KrF准分子激光为光源，以光管均匀器为主构成照明系统，采用带有平行平板为像差校正板的11折反射式投影光刻物镜，在两种光刻胶上分别获得了0.6 μm和0.5 μm的光刻分辨率。
准分子激光 激光光刻 亚微米光刻 光刻物镜
中国科学院上海光学精密机械研究所, 上海 201800
本文设计了一种新系列的紫外或远紫外激光光刻物镜,它与国内外已有的紫外物镜相比,在365nm以下的光谱区,具有更宽的光谱工作带宽和较高的数值孔径.以宽带准分子激光或短弧汞氙灯做光源,无需另加色散补偿光学元件,可以进行同轴对准.
紫外和远紫外光刻 准分子激光光刻 亚微米光刻
