[1] D. G. Stearns, R. S. Rosen, S. P. Vernon. Multilayer mirror technology for soft X-ray projection lithography. Appl. Opt., 1993, 32: 6952～6960

[2] G. Gutman. High-performance Mo/Si and WB4C multilayer mirrors for soft X-ray imaging optics. J. X-ray Sci. Technol., 1994, 4: 142～150

[3] Y. H. Guo, Z. X. Fan, O. Bin et al.. Determination of optical constants of thin film in the soft X-ray region. SPIE, 1991, 1519: 327～332

[4] Xu Zhenglian, Sun Jianhui. Measuring and control system for sychrotron radiation soft X-ray multilayer reflectometer. Optics and Precision Engineering (光学精密工程), 1995, 3(1): 45～49 (in Chinese)

[5] Fan Zhengxiu, Jin Lei, Shao Jianda. Optical properties and optimum design of soft X-ray multilayer. Chinese J. Lasers (中国激光), 1992, A19(1): 74～78 (in Chinese)

[6] Yin Gongjie, Fan Zhengxiu, Shao Jianda. Exact structure determination of Mo/Si soft X-ray multilayer by small angle difraction. Chinese J. Lasers (中国激光), 1993, A20(12): 900～905 (in Chinese)

[7] Shao Jianda, Fan Zhengxiu, Jin Lei et al.. Rotation-speed-controlled layer thickness of soft X-ray multilayer reflector. Chinese J. Lasers (中国激光), 1991, 18(3): 171～175 (in Chinese)

[8] Shao Jianda, Fan Zhengxiu, Wang Guiying et al.. Analysis of the structure and interfaces of multilayer using high-resolution transmission electron microscopy. Chinese J. Lasers (中国激光), 1994, A21(6): 457～462

[9] Xiong Yuenan, Ni Yuanlong, Wu Jiang et al.. Reflective characteristics of a soft X-ray multilayer mirror. Acta Optics Sinica (光学学报), 1997, 17(2): 243～248 (in Chinese)

[10] Shao Jianda, Fan Zhengxiu, Yi Kui et al.. The roughness of the very thin Si films. Chinese J. Lasers (中国激光), 1996, A23(9): 801～805 (in Chinese)