光学学报, 2016, 36 (8): 0811003, 网络出版: 2016-08-18   

基于交替相移掩模矢量空间像的偏振像差检测方法

Measuring Method of Polarization Aberration Based on Vector Aerial Image of Alternating Phase-shift Mask
作者单位
1 中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
2 中国科学院大学, 北京 100049成像系统
3 新疆师范大学物理与电子工程学院, 新疆, 乌鲁木齐 830000
4 中芯国际集成电路制造有限公司, 上海 201203
摘要
提出一种基于交替相移掩模空间像的光刻机投影物镜偏振像差检测方法。采用泡利-泽尼克系数表征偏振像差,结合X和Y两种线性偏振照明方式,用像传感器测量不同照明条件下掩模空间像的成像位置偏移与最佳焦面偏移,利用标定的偏振像差灵敏度矩阵计算获得泡利-泽尼克系数。采用光刻仿真软件对本文方法的有效性进行了验证,结果表明其检测精度优于3.07 mλ。
Abstract
A measuring method of polarization aberration based on aerial image of alternating phase-shift mask is proposed. The polarization aberration is represented by Pauli-Zernike coefficients. The image placement error and best focus shift are measured by image sensor at multiple illumination settings, combined with X and Y linearly polarized illuminating light. The Pauli-Zernike coefficients are retrieved using the calibrated sensitivity matrix of polarization aberration. The validity of this proposed method is verified by numerical simulations, and the results indicate that the measuring accuracy is less than 3.07 mλ.
参考文献

[1] Totzeck M, Graupner P, Heil T, et al. How to describe polarization influence on imaging[C]. SPIE, 2005, 5754: 23-37.

[2] Zhang Q, Song H, Lucas K. Polarization aberration modeling via Jones matrix in the context of OPC[C]. SPIE, 2007, 6730: 67301Q.

[3] 涂远莹. 光刻投影物镜偏振像差检测与补偿技术研究[D]. 上海: 中国科学院上海光学精密仪器研究所, 2013: 87-89.

    Tu Yuanying. Study on polarization aberration measurement and compensation techniques for lithographic projection optics[D]. Shanghai: Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, 2013: 87-89.

[4] 涂远莹, 王向朝. 一种基于线性模型的光刻投影物镜偏振像差补偿方法[J]. 光学学报, 2013, 33(6): 0622002.

    Tu Yuanying, Wang Xiangzhao. Polarization aberration compensation method for lithographic projection lens based on a linear model[J]. Acta Optica Sinica, 2013, 33(6): 0622002.

[5] Kye J, Mclntyre G, Norihiro Y, et al. Polarization aberration analysis in optical lithography systems[C]. SPIE, 2006, 6154: 61540E.

[6] Yamamoto N, Kye J, Levinson H J. Polarization aberration analysis using Pauli-Zernike representation[C]. SPIE, 2007, 6520: 65200Y.

[7] Geh B, Ruoff J, Zimmermann J, et al. The impact of projection lens polarization properties on lithographic process at hyper-NA[C]. SPIE, 2007, 6520: 65200F.

[8] Shiode Y, Ebiahara T. Study of polarization aberration measurement using SPIN method[C]. SPIE, 2006, 6154: 615431.

[9] Fujii T, Kudo Y J, Ohmura Y, et al. Polarization properties of state-of-art lithography optics represented by first canonical coordinate of Lie group[C]. SPIE, 2007, 6520: 65204W.

[10] Fujii T, Kogo J, Suzuki K, et al. Polarization characteristics of state-of-art lithography optics reconstructed from on-body measurement[C]. SPIE, 2008, 6924: 69240Z.

[11] Nomura H, Higashikawa I. Mueller matrix polarimetry for immersion lithography tools with a polarization monitoring system at the wafer plane[C]. SPIE, 2009, 7520: 752012.

[12] Nomura H, Higashikawa I. In-situ Mueller matrix polarimetry of projection lenses for 193-nm lithography[C]. SPIE, 2009, 7640: 76400Q.

[13] Dong L, Li Y, Dai X, et al. Measuring the polarization aberration of hyper-NA lens from the vector aerial image[C]. SPIE, 2009, 9283: 928313.

[14] Wong A K. Optical imaging in projection microlithography[M]. Bellingham: SPIE Press, 2005: 102-107.

[15] Arfken G B, Weber H J. Mathematical methods for physicists[M]. Burlington: Harcourt/Academic Press, 2001: 207.

[16] Mclntyre G R, Kye J, Neureuther A R. Polarization aberrations in hyper-numerical-aperture projection printing: A comparison of various representations[J]. J Micro/Nanolith MEMS MOEMS, 2006, 5(3): 033001.

[17] Shen L N, Li S K, Wang X Z, et al. Analytical analysis of the impact of polarization aberration of projection lens on lithographic imaging[J]. J Micro/Nanolith MEMS MOEMS, 2015, 14(4): 043504.

[18] Tu Y Y, Wang X Z, Li S K, et al. Analytical approach to the impact of polarization aberration on lithographic imaging[J]. Opt Lett, 2012, 37(11): 2061-2063.

沈丽娜, 王向朝, 李思坤, 闫观勇, 诸波尔, 孟泽江, 张恒. 基于交替相移掩模矢量空间像的偏振像差检测方法[J]. 光学学报, 2016, 36(8): 0811003. Shen Lina, Wang Xiangzhao, Li Sikun, Yan Guanyong, Zhu Boer, Meng Zejiang, Zhang Heng. Measuring Method of Polarization Aberration Based on Vector Aerial Image of Alternating Phase-shift Mask[J]. Acta Optica Sinica, 2016, 36(8): 0811003.

本文已被 2 篇论文引用
被引统计数据来源于中国光学期刊网
引用该论文: TXT   |   EndNote

相关论文

加载中...

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!