光子学报, 2015, 44 (10): 1011003, 网络出版: 2015-11-30
入射光束角度及强度偏差对多光束干涉光刻结果的影响
Influence on Patterns Quality of Multi-beam Interference Lithography Caused by the Deviations of Incidence Azimuth Angle and Intensity of Light
多光束干涉 干涉光刻 周期结构 角度偏差 光强偏差 干涉光强分布 Multi-beam interference Interference lithography Periodic structures Angle deviation Light intensity deviation Interference intensity distribution
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马丽娜, 张锦, 蒋世磊, 孙国斌, 杨国锋, 杭凌侠, 弥谦, 计玮. 入射光束角度及强度偏差对多光束干涉光刻结果的影响[J]. 光子学报, 2015, 44(10): 1011003. MA Li-na, ZHANG Jin, JIANG Shi-lei, SUN Guo-bin, YANG Guo-feng, HANG Ling-xia, MI Qian, JI Wei. Influence on Patterns Quality of Multi-beam Interference Lithography Caused by the Deviations of Incidence Azimuth Angle and Intensity of Light[J]. ACTA PHOTONICA SINICA, 2015, 44(10): 1011003.