应用激光, 2003, 23 (3): 144, 网络出版: 2006-05-10
准分子激光直写二维图形加工
On the excimer laser direct 2D etching
摘要
为了探索准分子激光脉冲直写加工的参数和工艺,建立准分子激光微加工系统和材料加工工艺,对二维加工过程中激光刻蚀效果与扫描速度和激光参数之间的关系进行了理论推导,分析表明最大扫描速度受激光光斑尺寸和重复频率的约束.以玻璃为实验靶材,在2.7×1mm2 范围内进行了二维图形刻蚀实验研究.结果显示,刻蚀对材料周围的热影响很小,刻蚀图形清洁而且清晰,通过控制扫描速度可以获得均匀的二维图形.
Abstract
In order to explore parameters and technics of pulsed excimer laser direct etching, and to establish a excimer laser micro-fabrication system and technics for material micro-fabrication, we analyzed relationship between scan velocity, parameters of excimer laser and etching effect. It is showed that the maximum scan velocity is restricted by the size of laser facula and its repeat frequency. A 2D picture was etched within an area of 2.7×1mm 2 with a piece of glass material. The result shows that etching impact little on the nearby material, the yielded picture is clean and clear. A uniform picture can be obtained through proper controlling of scan velocity
参考文献
[1] 袁根福,曾晓雁.硬脆性无机材料激光成形加工研究与应用现状.激光与光电子学进展. 2002,39(6):47-51
[2] 刘文波. 准分子激光微加工应用研究, 武汉:武汉工业大学硕士论文, 1997
[3] J. Ihlemann, K. Rubahn. Excimer laser micro machining: fabrication and applications of dielectric masks, Applied Surface Science, 154-155 (2000): 587-592
[4] A. Braun,K. Zimmer, B. Hosselbarth, J. Meinhardt, F. Bigl, R. Mehnert. Excimer laser micromachining and replication of 3D optical Surfaces, Applied Surface Science, 127-129(1998): 911-914
[5] H. Ohji, P.J. French, K. Tsutsumi. Fabrication of mechanical structures in p-type silicon using electrochemical etching, Sensors and Actuators, 82 (2000): 254
魏仁选, 姜德生. 准分子激光直写二维图形加工[J]. 应用激光, 2003, 23(3): 144. 魏仁选, 姜德生. On the excimer laser direct 2D etching[J]. APPLIED LASER, 2003, 23(3): 144.