光学学报, 2020, 40 (14): 1431002, 网络出版: 2020-07-23
磁控共溅射制备Si掺杂Al薄膜的应力研究 
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Study on Stress in Si-Doped Al Thin Films Prepared by Magnetron Co-Sputtering
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朱京涛, 周涛, 朱杰, 赵娇玲, 朱航宇. 磁控共溅射制备Si掺杂Al薄膜的应力研究[J]. 光学学报, 2020, 40(14): 1431002.
Jingtao Zhu, Tao Zhou, Jie Zhu, Jiaoling Zhao, Hangyu Zhu. Study on Stress in Si-Doped Al Thin Films Prepared by Magnetron Co-Sputtering[J]. Acta Optica Sinica, 2020, 40(14): 1431002.
朱京涛, 周涛, 朱杰, 赵娇玲, 朱航宇. 磁控共溅射制备Si掺杂Al薄膜的应力研究[J]. 光学学报, 2020, 40(14): 1431002. Jingtao Zhu, Tao Zhou, Jie Zhu, Jiaoling Zhao, Hangyu Zhu. Study on Stress in Si-Doped Al Thin Films Prepared by Magnetron Co-Sputtering[J]. Acta Optica Sinica, 2020, 40(14): 1431002.
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