基底温度和离子源能量对薄膜应力的影响 下载: 986次
郝帅, 崔碧峰, 房天啸, 王阳. 基底温度和离子源能量对薄膜应力的影响[J]. 激光与光电子学进展, 2018, 55(9): 093101.
Hao Shuai, Cui Bifeng, Fang Tianxiao, Wang Yang. Effects of Substrate Temperature and Ion Source Energy on Stress of Thin Film[J]. Laser & Optoelectronics Progress, 2018, 55(9): 093101.
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郝帅, 崔碧峰, 房天啸, 王阳. 基底温度和离子源能量对薄膜应力的影响[J]. 激光与光电子学进展, 2018, 55(9): 093101. Hao Shuai, Cui Bifeng, Fang Tianxiao, Wang Yang. Effects of Substrate Temperature and Ion Source Energy on Stress of Thin Film[J]. Laser & Optoelectronics Progress, 2018, 55(9): 093101.