发光学报, 2011, 32 (6): 593, 网络出版: 2011-06-24   

850 nm高亮度锥形半导体激光器的光电特性

Electro-optic Properties of 850 nm High-brightness Tapered Lasers
作者单位
1 中国科学院 激发态物理重点实验室 长春光学精密机械与物理研究所, 吉林 长春 130033
2 中国科学院 研究生院, 北京 100039
引用该论文

杨晔, 刘云, 秦莉, 张金龙, 彭航宇, 王烨, 李再金, 胡黎明, 史晶晶, 王超, 宁永强, 王立军. 850 nm高亮度锥形半导体激光器的光电特性[J]. 发光学报, 2011, 32(6): 593.

YANG Ye, LIU Yun, QIN Li, ZHANG Jin-long, PENG Hang-yu, WANG Ye, LI Zai-jin, HU Li-ming, SHI Jing-jing, WANG Chao, NING Yong-qiang, WANG Li-jun. Electro-optic Properties of 850 nm High-brightness Tapered Lasers[J]. Chinese Journal of Luminescence, 2011, 32(6): 593.

参考文献

[1] Zhu Liyan, Fu Xiuhua. The technical development of the 850 nm high-luminance semiconductor lasers film [J]. Journal of Changchun University of Science and Technology (长春理工大学学报), 2007, 30(1):18-20 (in Chinese).

[2] Qu Zhou, Liu Yang, Liu Bo. High power semiconductor laser and its applications in military [J]. OME Information (光机电信息), 2006, 23(1):52-55 (in Chinese).

[3] Liu Yun, Liao Xinsheng, Qin Li, et al. Oxygen-free copper microchannel heat sink of high power semiconductor laser [J]. Chin. J. Lumin. (发光学报), 2005, 26(1):109-114 (in Chinese).

[4] Liang Xuemei1, Lv Jinka, Cheng Liwen, et al. Structural design of vertical-external-cavity surface-emitting semiconductor laser with 920 nm [J]. Chin. J. Lumin. (发光学报), 2010, 31(1):79-85 (in English).

[5] Cheng Liwen, Liang Xuemei, Qin Li, et al. Theoretical analysis of key parameters of 980nm optically pumped semiconductor vertical external cavity surface emitting laser [J]. Chin. J. Lumin. (发光学报), 2008, 29(4):713-715 (in Chinese).

[6] Ma Qiang, Tian Zhenhua, Wang Zhenfu, et al. A theoretical model of high power VCSEL based on the thermal-offset-current [J]. Chin. J. Lumin. (发光学报), 2009, 30(4):463-466 (in Chinese).

[7] Adamiec P, Sumpf B, Rüdiger I, et al. Tapered lasers emitting at 650 nm with 1 W output power with nearly diffraction-limited beam quality [J]. Optics Lett., 2009, 34(16):2456-2458.

[8] Dittmar F, Klehr A, Sumpf B, et al. 9 W output power from an 808 nm tapered diode laser in pulse mode operation with nearly diffraction-limited beam quality [J]. IEEE Quantum Electronics, 2007, 13(5):1194-1199.

[9] Kelemen M T, Weber J, Bihlmann G, et al. Tapered diode lasers at 976 nm with 8 W nearly diffraction limited output power [J]. Electronics Lett., 2005, 41(18):1011-1013.

[10] Hwang R Y, Luh S W, Hsu J K, et al. Critical comparison of DH, SCH, and GRIN-SCH-SQW 780 nm ridge-waveguide lasers [J]. SPIE, 1992, 1813:178-184.

[11] Wright D, Greve P, Fleischer J, et al. Laser beam width, divergence and beam propagation factor-an international standardization approach [J]. Optical and Quantum Electronics, 1992, 24(9):993-1000.

杨晔, 刘云, 秦莉, 张金龙, 彭航宇, 王烨, 李再金, 胡黎明, 史晶晶, 王超, 宁永强, 王立军. 850 nm高亮度锥形半导体激光器的光电特性[J]. 发光学报, 2011, 32(6): 593. YANG Ye, LIU Yun, QIN Li, ZHANG Jin-long, PENG Hang-yu, WANG Ye, LI Zai-jin, HU Li-ming, SHI Jing-jing, WANG Chao, NING Yong-qiang, WANG Li-jun. Electro-optic Properties of 850 nm High-brightness Tapered Lasers[J]. Chinese Journal of Luminescence, 2011, 32(6): 593.

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