Mo/Si多层膜表面保护层设计
徐达, 朱京涛, 张众, 王风丽, 王晓强, 王洪昌, 蒋励, 佘仕凤, 王占山, 秦树基, 陈玲燕. Mo/Si多层膜表面保护层设计[J]. 光子学报, 2009, 38(1): 160.
XU Da, ZHU Jing-tao, ZHANG Zhong, WANG Feng-li, WANG Xiao-qiang, WANG Hong-chang, JIANG Li, SHE Shi-feng, WANG Zhan-shan, QIN Shu-ji, CHEN Ling-yan. Design of Capping Layers on Mo/Si Multilayer[J]. ACTA PHOTONICA SINICA, 2009, 38(1): 160.
[1] 杨雄，金春水，张立超，极紫外投影光刻掩膜的多层膜与照明误差[J].光子学报，2006,35(5):667-670.
[2] 顾春时，王占山，穆宝忠，等.基于非周期多层膜的X射线成像研究[J].光子学报，2006，35(6):881-885.
[3] 秦俊岭，邵建达，易葵，等．研究扩散屏障层对Mo/Si多层膜软X射线反射率影响的模拟[J].光子学报，2007,36(2):300-303.
[4] 孔伟金，沈健，沈自才，等.脉宽压缩光栅用多层膜制备和性能测试[J] .光子学报，2006,35(1):84-88.
[5] WEDOWSKI M,BAJT S,FOLTA J A,et al.Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography[C].SPIE,1999,3767:217-224.
[6] SINGH M,BRAAT J J M.Improved theoretical reflectivities of extreme ultraviolet mirrors[C].SPIE,2000,3997:412-419.
[7] BAJT S,ALAMEDA J,BARBEE Jr T,et al.Improved reflectance and stability of Mo/Si multilayers[C].SPIE,2001,4506:65-75.
[8] BAJT S,CHAPMAN H N,NGUYEN N,et al.Design and performance of capping layers for EUV multilayer mirrors[C],SPIE,2003,5037:236-248.
[9] YAN P Y,SPILLER E ,GULLIKSON E,et al.Evaluation of alternative capping layers for EUVL mask ML blank[C]. SPIE,2005,5992:59923Z-1-59923Z-10.
[10] YAN P Y,SPILLER E.New EUVL ML capping design for ML blank multiple reuses[C].SPIE,2005,5853:329-335.
[11] MALINOWSKI M,STEINHAUS C,CLIFT M,et al.Controlling contamination in Mo/Si multilayer mirrors by Si surface-capping modifications[C].SPIE,2002,4668:442-453.
[12] . Capping layers for extreme-ultraviolet multilayer interference coatings[J]. Opt Lett, 2001, 26(5): 259-261.
[13] . Analysis of the reflective performance of EUV multilayer under the inflnence of capping layer[J]. Acta Physica Sinica, 2004, 53(7): 2368-2372.
[14] YAN P Y,ZHANG G J,SPILLER E.Ru Capped EUVL ML Mask Blank Performance[C].SPIE,2004,5446:824-831.
[15] BAJT S,DAI Z R,NELSON E J,et al.Oxidation resistance of Ru-copped EUV multilayers[C].SPIE,2005,5751:118-127.
徐达, 朱京涛, 张众, 王风丽, 王晓强, 王洪昌, 蒋励, 佘仕凤, 王占山, 秦树基, 陈玲燕. Mo/Si多层膜表面保护层设计[J]. 光子学报, 2009, 38(1): 160. XU Da, ZHU Jing-tao, ZHANG Zhong, WANG Feng-li, WANG Xiao-qiang, WANG Hong-chang, JIANG Li, SHE Shi-feng, WANG Zhan-shan, QIN Shu-ji, CHEN Ling-yan. Design of Capping Layers on Mo/Si Multilayer[J]. ACTA PHOTONICA SINICA, 2009, 38(1): 160.
PDF全文
