中国激光, 1992, 19 (5): 357, 网络出版: 2007-09-11
准分子激光诱导沉积锰和钨薄膜
Excimer laser-induced deposition of manganese and tungsten thin film
摘要
用波长为308 nm XeCl准分子激光辐射光解羰基锰二聚物Mn2(CO)10和羰基钨W(CO)。沉积锰和钨薄膜,研究了实验参量与薄膜特性之间的关系。
Abstract
We report here in the deposition of manganese and tungsten thin films by 308 nm XeCl excimer laser induced photolys is of manganese pentacarbonyl dimer Mn2(CO)10 and tungsten hexacarbonyls W(CO)6 respectively. The dependence of the features of the thin film on the; experimental parameters has been studied.
参考文献
徐捷, 吕新明, 楼祺洪. 准分子激光诱导沉积锰和钨薄膜[J]. 中国激光, 1992, 19(5): 357. 徐捷, 吕新明, 楼祺洪. Excimer laser-induced deposition of manganese and tungsten thin film[J]. Chinese Journal of Lasers, 1992, 19(5): 357.