[1] Yang G Y, Hirsch D, Li J Y, et al. Energy dependence of morphologies on photoresist surfaces under Ar + ion bombardment with normal incidence[J]. Applied Surface Science, 2020, 523: 146510.

[2] Zhou J, Lu M. Mechanism of Fe impurity motivated ion-nanopatterning of Si (100) surfaces[J]. Physical Review B, 2010, 82(12): 125404.

[3] Facsko S. Formation of ordered nanoscale semiconductor dots by ion sputtering[J]. Science, 1999, 285(5433): 1551-1553.

[4] Liao W L, Dai Y F, Nie X T, et al. Nanostructure formation and regulation during low-energy ion beam sputtering of fused silica surfaces[J]. Optical Engineering, 2017, 56(12): 125102.

[5] 费芒芒, 陈智利, 刘卫国, 等. 低能Kr +离子束诱导蓝宝石晶体实验研究[J]. 光子学报, 2019, 48(6): 0616004.

    Fei M M, Chen Z L, Liu W G, et al. Experimental research on sapphire crystal induced by low energy Kr + ion beam[J]. Acta Photonica Sinica, 2019, 48(6): 0616004.

[6] Bradley R M. Harper J M E. Theory of ripple topography induced by ion bombardment[J]. Journal of Vacuum Science & Technology A, 1988, 6(4): 2390-2395.

[7] B, 1996, 54( 24): 17647- 17653.

    CarterG, VishnyakovV. Roughening and ripple instabilities on ion-bombarded Si[J]. Physical Review

[8] 宋辞, 田野, 石峰, 等. 单晶硅柱面反射镜离子束倾斜入射加工工艺优化[J]. 光学学报, 2020, 40(12): 1222001.

    Song C, Tian Y, Shi F, et al. Process optimization for cylindrical single-crystal silicon mirror with a tilted incident ion beam figuring[J]. Acta Optica Sinica, 2020, 40(12): 1222001.

[9] Liu Y, Xu D Q, Xu X D, et al. Reactive ion beam etching of large-aperture multilayer diffraction gratings by radio frequency ion beam source[J]. Proceedings of SPIE, 2007, 6724: 67240K.

[10] Huang Q S, jia Q, Feng J T, et al. Realization of wafer-scale nanogratings with sub-50 nm period through vacancy epitaxy[J]. Nature Communications, 2019, 10: 2437.

[11] 赖淑妹, 黄志伟, 王仰江, 等. Ag纳米结构局域表面等离激元共振模拟与分析[J]. 激光与光电子学进展, 2018, 55(12): 122601.

    Lai S M, Huang Z W, Wang Y J, et al. Simulation and analysis of local surface plasmon resonance of Ag nanostructures[J]. Laser & Optoelectronics Progress, 2018, 55(12): 122601.

[12] Chen D K, Yang G Y, Li J Y, et al. Terrace morphology on fused silica surfaces by Ar + ion bombardment with Mo co-deposition[J]. Applied Physics Letters, 2018, 113(3): 033102.

[13] Ye X, Shao T, Sun L X, et al. Plasma-induced, self-masking, one-step approach to an ultrabroadband antireflective and superhydrophilic subwavelength nanostructured fused silica surface[J]. ACS Applied Materials & Interfaces, 2018, 10(16): 13851-13859.

[14] 皮顿, 单子豪, 吴兴坤. 光纤通信波段微光学元件的抗反射纳米结构[J]. 光学学报, 2020, 40(6): 0622002.

    Pi D, Shan Z H, Wu X K. Nanostructured antireflection micro-optics in the optical fiber communication band[J]. Acta Optica Sinica, 2020, 40(6): 0622002.

[15] 姚尧, 沈悦, 郝加明, 等. 基于亚波长人工微结构的电磁波减反增透研究进展[J]. 物理学报, 2019, 68(14): 147802.

    Yao Y, Shen Y, Hao J M, et al. Antireflection coatings based on subwavelength artificial engineering microstructures[J]. Acta Physica Sinica, 2019, 68(14): 147802.

[16] Chiappe D, Toma A, Zhang Z, et al. Amplified nanopatterning by self-organized shadow mask ion lithography[J]. Applied Physics Letters, 2010, 97(5): 053102.