光学学报, 2015, 35 (6): 0622005, 网络出版: 2015-05-20
基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型
Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography
引用该论文
刘晓雷, 李思坤, 王向朝. 基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型[J]. 光学学报, 2015, 35(6): 0622005.
Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 0622005.
刘晓雷, 李思坤, 王向朝. 基于等效膜层法的极紫外光刻含缺陷掩模多层膜仿真模型[J]. 光学学报, 2015, 35(6): 0622005. Liu Xiaolei, Li Sikun, Wang Xiangzhao. Simulation Model Based on Equivalent Layer Method for Defective Mask Multilayer in Extremeultra violet Lithography[J]. Acta Optica Sinica, 2015, 35(6): 0622005.