溅射法制备多层膜沉积速率的标定
张立超. 溅射法制备多层膜沉积速率的标定[J]. 光学 精密工程, 2010, 18(12): 2530.
ZHANG Li-chao. Calibration of deposition rates of multilayer coatings by sputtering depositions[J]. Optics and Precision Engineering, 2010, 18(12): 2530.
[1] ATTOWOOD D. 软X射线与极紫外辐射的原理和应用. [M]. 北京: 科学出版社, 2003.
ATTOWOOD D T. Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications[M].Beijing: Science Press, 2003. (in Chinese)
[2] SPILLER E. Soft X-Ray Optics [M]. Bellingham: SPIE Press, 1994.
[3] . High performance multilayer coatings for EUV lithography.[J]. SPIE, 2004, 5193: 89-97.
[4] . . Broadband multilayer-coated normal incidence blazed grating with -10% diffraction efficiency through the 13~16nm wavelength region[J]. Opt. Lett., 2009, 34(6): 818-820.
[5] 柯常军,王占山,郑咏梅,等. 宽带平坦型软X射线多层反射膜的设计[J].光学 精密工程,1999,7(3):19-22.
KE C J, WANG Z S, ZHENG Y M, et al.. The Design of Soft X-ray Broadband and Flat Multilaye [J]. Opt. Precision Eng., 1999,7(3):19-22. (in Chinese)
[6] 张众,王占山,王风丽,等.X射线超反射镜的设计[J].光学 精密工程,2003,11(1):49-54.
[7] 朱京涛,王占山,王洪昌,等. 极紫外宽带Mo/Si非周期多层膜偏振光学元件[J].光学 精密工程,2007,15(12):1886-1893.
[8] 王占山. 膜厚控制误差对软X射线多层膜性能影响的分析[J].光学 精密工程,2003,11(2):136-138.
[9] . . Silicide layer growth rates in Mo/Si multilayers.[J]. Appl. Op.t, 1993, 32(34): 6975-6980.
[10] . . Determination of the deposition rate of DC magnetron sputtering in fabrication of X-ray suppermirrors Chin[J]. Opt. Lett., 2006, 4(9): 550-552.
[11] . X射线衍射仪装调误差分析[J]. 分析仪器, 2008, 1: 14-18.
ZHU H L, JIN C S, ZHANG L C. Analysis and correction of sample fixing and adjustment errors in X-ray diffractometer [J]. Analytical Instrumentation 2008(1):14-18. (in Chinese)
张立超. 溅射法制备多层膜沉积速率的标定[J]. 光学 精密工程, 2010, 18(12): 2530. ZHANG Li-chao. Calibration of deposition rates of multilayer coatings by sputtering depositions[J]. Optics and Precision Engineering, 2010, 18(12): 2530.