光学 精密工程, 2010, 18 (12): 2530, 网络出版: 2011-01-26
溅射法制备多层膜沉积速率的标定
Calibration of deposition rates of multilayer coatings by sputtering depositions
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张立超. 溅射法制备多层膜沉积速率的标定[J]. 光学 精密工程, 2010, 18(12): 2530. ZHANG Li-chao. Calibration of deposition rates of multilayer coatings by sputtering depositions[J]. Optics and Precision Engineering, 2010, 18(12): 2530.