红外与激光工程, 2018, 47 (9): 0920006, 网络出版: 2018-10-06  

γ射线辐照对130 nm部分耗尽SOI MOS器件栅氧经时击穿可靠性的影响

Effects of time-dependent dielectric breakdown reliability of 130 nm partially depleted SOI MOS devices exposed to γ-ray
马腾 1,2,3苏丹丹 1,2,3周航 1,2,3郑齐文 1,2崔江维 1,2魏莹 1,2余学峰 1,2郭旗 1,2
作者单位
1 中国科学院新疆理化技术研究所 中国科学院特殊环境功能材料与器件重点实验室, 新疆 乌鲁木齐 830011
2 新疆电子信息材料与器件重点实验室, 新疆 乌鲁木齐 830011
3 中国科学院大学, 北京 100049
引用该论文

马腾, 苏丹丹, 周航, 郑齐文, 崔江维, 魏莹, 余学峰, 郭旗. γ射线辐照对130 nm部分耗尽SOI MOS器件栅氧经时击穿可靠性的影响[J]. 红外与激光工程, 2018, 47(9): 0920006.

Ma Teng, Su Dandan, Zhou Hang, Zheng Qiwen, Cui Jiangwei, Wei Ying, Yu Xuefeng, Guo Qi. Effects of time-dependent dielectric breakdown reliability of 130 nm partially depleted SOI MOS devices exposed to γ-ray[J]. Infrared and Laser Engineering, 2018, 47(9): 0920006.

参考文献

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马腾, 苏丹丹, 周航, 郑齐文, 崔江维, 魏莹, 余学峰, 郭旗. γ射线辐照对130 nm部分耗尽SOI MOS器件栅氧经时击穿可靠性的影响[J]. 红外与激光工程, 2018, 47(9): 0920006. Ma Teng, Su Dandan, Zhou Hang, Zheng Qiwen, Cui Jiangwei, Wei Ying, Yu Xuefeng, Guo Qi. Effects of time-dependent dielectric breakdown reliability of 130 nm partially depleted SOI MOS devices exposed to γ-ray[J]. Infrared and Laser Engineering, 2018, 47(9): 0920006.

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