光散射学报, 2008, 20 (3): 258, 网络出版: 2014-01-21
532nm连续激光晶化非晶硅薄膜的原位拉曼光谱研究
In-situ Raman Spectroscopic Study on the Crystallization of Amorphous Silicon Thin Films with a 532 nm Continuous-wave Laser
补充材料
徐二明, 袁超, 王俊平, 霍浩磊, 梁二军. 532nm连续激光晶化非晶硅薄膜的原位拉曼光谱研究[J]. 光散射学报, 2008, 20(3): 258. XU Er-ming, Yuan Chao, WANG Jun-ping, HUO Hao-lei, LIANG Er-jun. In-situ Raman Spectroscopic Study on the Crystallization of Amorphous Silicon Thin Films with a 532 nm Continuous-wave Laser[J]. The Journal of Light Scattering, 2008, 20(3): 258.