不同氧气流量对直流磁控溅射TiO<sub>2</sub>薄膜的影响

樊晓娟; 赖珍荃; 李睿

doi:doi:10.3788/gzxb20124110.1247

光子学报, 2012, 41 (10): 1247, 网络出版: 2012-11-07

不同氧气流量对直流磁控溅射TiO₂薄膜的影响

Influence of the Oxygen Flow on TiO₂ Thin Films Prepared by DC Magnetron Sputtering

论文大纲

樊晓娟 ^*赖珍荃李睿

作者单位

南昌大学物理系, 南昌 330031

TiO2薄膜直流磁控溅射氧气流量透射率 TiO2 thin films DC magnetron sputting Oxygen flow Thansmittance

摘要

采用直流反应磁控溅射法, 以高纯Ti为靶材, 高纯O2为反应气体, 制备了TiO2薄膜.研究了氧气流量对薄膜结晶取向、表面形貌和光学性能的影响.研究发现, TiO2薄膜主要呈锐钛矿TiO2(101)择优取向, 当氧气流量较小时, 薄膜中还含有金属Ti(100), 氧气流量较大时, 薄膜含TiO2(101)和TiO2(004), 成多晶态; 薄膜的粗糙度和颗粒大小都随氧气流量的增大而增大; 薄膜在400~1 100 nm可见-近红外波段有较高的透射率并且其吸收峰随着氧气流量的增大而红移, 当氧气流量为5 sccm时, 平均透射率最高.

Abstract

TiO2 thin films were prepared by DC reactive magnetron sputting using high putity Ti as the targets and high O2 as the reaction gas. The influence of the oxygen flow on the film crystalline orientation,surface morphology and optical properties were studied. The results show that the TiO2 films is anatase TiO2 (101) preferred orientation; when the oxygen flow rate is small, the film also contains metal Ti(100); when the oxygen flow was larger, the films containing TiO2(101) and (004) into a polycrystalline state;the roughness and particle size of the films increases with oxygen flow; film visible- near-infrared bands have a higher transmission rate and the absorption peak increases with the oxygen flow in the 400~1 100 nm redshift; when oxygen flow 5 sccm, the average transmission is largest.

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樊晓娟, 赖珍荃, 李睿. 不同氧气流量对直流磁控溅射TiO₂薄膜的影响[J]. 光子学报, 2012, 41(10): 1247. FAN Xiao-juan, LAI Zhen-quan, LI Rui. Influence of the Oxygen Flow on TiO₂ Thin Films Prepared by DC Magnetron Sputtering[J]. ACTA PHOTONICA SINICA, 2012, 41(10): 1247.

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