采用直流磁控溅射方法制备了一维二组元Cu/Ti周期超晶格金属薄膜，研究了基片温度、膜周期数、基片取向与紫外反射的关系。当基片加热温度为470℃时，在硅（100）晶面上生长的30层Cu/Ti膜，层间膜厚控制在1:3、膜总厚度控制为300nm时，所制备的超晶格薄膜在5°入射角下对200nm的紫外光,其反射率可高达90%。

One-dimensional and two-component Cu/Ti superlattice films have been deposited by DC magnetron sputtering. The influences of substrate temperature, periodic number and substrate structure on UV-reflectivity of Cu/Ti superlattic films are studied. The films fabricated at 470 ℃ substrate temperature, on Si(100) substrate and with 30 pair layers have a high UV-reflectivity of about 90% at 200 nm and 5° from normal incidence.