强激光与粒子束, 2016, 28 (6): 064102, 网络出版: 2016-04-12
严格电磁场波导方法的三维厚胶光刻工艺仿真
Rigorous electromagnetic field model based on waveguide method for 3D thick resist lithography simulation
基本信息
| DOI: | 10.11884/hplpb201628.064102 |
| 中图分类号: | TN305.7 |
| 栏目: | 微纳技术 |
| 项目基金: | supported by the Natural Science Foundation in Jiangsu Province (BK2012324) |
| 收稿日期: | 2015-10-30 |
| 修改稿日期: | 2015-12-15 |
| 网络出版日期: | 2016-04-12 |
| 通讯作者: | 王禹欣 (wyxkx55@163.com) |
| 备注: | -- |
王禹欣, 周再发, 华杰, 王飞, 徐焕文, 黄庆安. 严格电磁场波导方法的三维厚胶光刻工艺仿真[J]. 强激光与粒子束, 2016, 28(6): 064102. Wang Yuxin, Zhou Zaifa, Hua Jie, Wang Fei, Xu Huanwen, Huang Qing’an. Rigorous electromagnetic field model based on waveguide method for 3D thick resist lithography simulation[J]. High Power Laser and Particle Beams, 2016, 28(6): 064102.
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