强激光与粒子束, 2016, 28 (6): 064102, 网络出版: 2016-04-12
严格电磁场波导方法的三维厚胶光刻工艺仿真
Rigorous electromagnetic field model based on waveguide method for 3D thick resist lithography simulation
光刻仿真 微机电系统 波导 光强分布 lithography simulation micro-electro-mechanics system waveguide light intensity distribution
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王禹欣, 周再发, 华杰, 王飞, 徐焕文, 黄庆安. 严格电磁场波导方法的三维厚胶光刻工艺仿真[J]. 强激光与粒子束, 2016, 28(6): 064102. Wang Yuxin, Zhou Zaifa, Hua Jie, Wang Fei, Xu Huanwen, Huang Qing’an. Rigorous electromagnetic field model based on waveguide method for 3D thick resist lithography simulation[J]. High Power Laser and Particle Beams, 2016, 28(6): 064102.