激光与光电子学进展, 2017, 54 (2): 023401, 网络出版: 2017-02-10
极紫外光刻动态气体锁抑制率的仿真研究 下载: 567次
Simulation Investigation on Suppression Ratio of Dynamic Gas Lock in Extreme Ultraviolet Lithography
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陈进新, 王宇, 谢婉露. 极紫外光刻动态气体锁抑制率的仿真研究[J]. 激光与光电子学进展, 2017, 54(2): 023401. Chen Jinxin, Wang Yu, Xie Wanlu. Simulation Investigation on Suppression Ratio of Dynamic Gas Lock in Extreme Ultraviolet Lithography[J]. Laser & Optoelectronics Progress, 2017, 54(2): 023401.