光散射学报, 2009, 21 (3): 251, 网络出版: 2014-01-21   

一种新型硅基3C-SiC的生长方法及光谱学表征

New Synthesis of 3C-SiC Film and Optical Characteristics Study on Silicon Substrate
作者单位
1 四川大学物理科学与技术学院微电子实验室, 成都 610064
2 四川大学分析测试中心, 成都 610064
3 四川大学材料科学与技术学院, 成都 610064
引用该论文

程顺昌, 杨治美, 钟玉杰, 何毅, 孙小松, 龚敏. 一种新型硅基3C-SiC的生长方法及光谱学表征[J]. 光散射学报, 2009, 21(3): 251.

CHENG Shun-chang, YANG Zhi-mei, ZHONG Yu-jie, HE Yi, SUN Xiao-song, GONG Min. New Synthesis of 3C-SiC Film and Optical Characteristics Study on Silicon Substrate[J]. The Journal of Light Scattering, 2009, 21(3): 251.

参考文献

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程顺昌, 杨治美, 钟玉杰, 何毅, 孙小松, 龚敏. 一种新型硅基3C-SiC的生长方法及光谱学表征[J]. 光散射学报, 2009, 21(3): 251. CHENG Shun-chang, YANG Zhi-mei, ZHONG Yu-jie, HE Yi, SUN Xiao-song, GONG Min. New Synthesis of 3C-SiC Film and Optical Characteristics Study on Silicon Substrate[J]. The Journal of Light Scattering, 2009, 21(3): 251.

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